cam a22 u 4500 128711272 CHVBK 20200921121747.0 880212s1978 xxu | 10 |eng|d 0-89252-162-7 (OCoLC)636396000 (NEBIS)000258826 ETH-BIB ger ETH-BIB ETHICS-ISBD Developments in semiconductor microlithography III (third annual user-oriented seminar-in-depth and instrument display), San Jose, Calif., April 10-11, 1978 ed.: Richard L. Ruddell a.o Bellingham, Wash. 1978 VI, 170 p. fig.; tab.; diagr. Proceedings of the Society of Photo-Optical Instrumentation Engineers vol. 135 135 (NEBIS)000024472 126529116 PHOTOLITHOGRAPHIE (PHOTOGRAPHIE) ger (ETHUDK)000035946 ethudk Konferenzschrift San Jose (CA) 1978 gnd-content u PHOTOLITHOGRAPHIE (PHOTOGRAPHIE) ger 776 nebis E1 u PHOTOLITHOGRAPHY (PHOTOGRAPHY) eng 776 nebis E1 u PHOTOLITHOGRAPHIE (PHOTOGRAPHIE) fre 776 nebis E1 Ruddell Richard L. Semiconductor Microlithography (DE-588)1091874956 BK020800 XK020000 XK020000 San Jose (CA) Kongress = Congrès 1978 NEBIS E01 E01 MG P 713011: 135 NEBIS 490 -- Proceedings of the Society of Photo-Optical Instrumentation Engineers vol. 135 135 (NEBIS)000024472 126529116 NEBIS 700 1- Ruddell Richard L. NEBIS 711 2- Semiconductor Microlithography (DE-588)1091874956