cam a22 u 4500 128712864 CHVBK 20200921064400.0 hz ||||-|||| 880212s1981 xxu |b 00 |eng|d AD-A-100962 (OCoLC)637370509 (NEBIS)000251544 ETH-BIB ger ETH-BIB ETHICS-ISBD Study of the physics of insulating films as related to the reliability of metal-oxide semiconductor(MOS) devices Mikroform interim report : semi-annual technical report, December 1, 1980 - May 31, 1981 by D.J.DiMaria a.o.; prep.: IBM T.J.Watson research Center, Yorktown Heights - N.Y STUDY of the PHYSICS of INSULATING FILMS AS RELATED to the RELIABILITY of METAL - OXIDE SEMICONDUCTOR DEVICES Springfield - Va. 1981 2 Microfiches. MOS-TECHNOLOGIE + MOS TECHNIK (ELEKTRONIK) ger (ETHUDK)000057872 ethudk u MOS-TECHNOLOGIE + MOS TECHNIK (ELEKTRONIK) ger 621.3.049/.38*1 nebis E1 u MOS-TECHNOLOGY + MOS-TECHNIQUES (ELECTRONICS) eng 621.3.049/.38*1 nebis E1 u TECHNOLOGIE MOS + TECHNIQUE MOS (ÉLECTRONIQUE) fre 621.3.049/.38*1 nebis E1 Dimaria D.J. BK020000 XK020000 XK020000 1 MF Andere Mikroform = Autre microforme NEBIS E01 E01 RP MIKR: ADA100962 NEBIS 700 1- Dimaria D.J.