cam a22 u 4500 128724978 CHVBK 20200921121805.0 880212s1982 xxu | 10 |eng|d 0-89252-368-9 (OCoLC)636400285 (NEBIS)000260215 ETH-BIB ger ETH-BIB ETHICS-ISBD Submicron lithography (proceedings of the meeting); Santa Clara - Calif., March 29-30, 1982 chairman, ed.: Phillip D.Blais Bellingham - Wash. 1982 VIII, 179 p. fig.; tab. Proceedings of SPIE - the International Society for Optical Engineering vol. 333 333 (NEBIS)000477279 130527327 LITHOGRAPHIE + MIKROLITHOGRAPHIE + NANOLITHOGRAPHIE (MIKROELEKTRONIK) ger (ETHUDK)000049370 ethudk MIKROELEKTRONIK + INTEGRIERTE SCHALTUNGEN ger (ETHUDK)000028107 ethudk Konferenzschrift Santa Clara (CA) 1982/03 gnd-content u LITHOGRAPHIE + MIKROLITHOGRAPHIE + NANOLITHOGRAPHIE (MIKROELEKTRONIK) ger 621.3.049.7,11 nebis E1 u MIKROELEKTRONIK + INTEGRIERTE SCHALTUNGEN ger 621.3.049.77 nebis E1 u LITHOGRAPHY + MICROLITHOGRAPHY + NANOLITHOGRAPHY (MICROELECTRONICS) eng 621.3.049.7,11 nebis E1 u LITHOGRAPHIE + MICROLITHOGRAPHIE + NANOLITHOGRAPHIE (MICROÉLECTRONIQUE) fre 621.3.049.7,11 nebis E1 u MICROÉLECTRONIQUE + CIRCUITS INTÉGRÉS fre 621.3.049.77 nebis E1 u MICROELECTRONICS + INTEGRATED CIRCUITS eng 621.3.049.77 nebis E1 Blais P.D. BK020800 XK020000 XK020000 Santa Clara (CA) Kongress = Congrès 1982/03 NEBIS E01 E01 MG P 713011: 333 NEBIS 490 -- Proceedings of SPIE - the International Society for Optical Engineering vol. 333 333 (NEBIS)000477279 130527327 NEBIS 700 1- Blais P.D.