Emerging lithographic technologies IX

1-3 March 2005, San Jose, California, USA

Verfasser / Beitragende:
R. Scott Mackay, chair/ed ; spons. and publ. by SPIE - The International Society for Optical Engineering ; cooperating org.: International SEMATECH
Ort, Verlag, Jahr:
Bellingham, Washington : SPIE, 2005
Beschreibung:
2 parts
Format:
Buch (Kongress)
ID: 161487041