CAD der Mikroelektronik
Simulation, Layout und Testdatenerstellung
| LEADER | cam a22 u 4500 | ||
|---|---|---|---|
| 001 | 277928818 | ||
| 003 | CHVBK | ||
| 005 | 20200923103451.0 | ||
| 008 | 130818s1997 gw |||||||||| 00 |ger d | ||
| 015 | |a 97,N09,0636 | ||
| 020 | |a 3-486-24114-1 | ||
| 035 | |a (IDSBB)001413231 | ||
| 035 | |a (NEBIS)001747765 | ||
| 040 | |a SzZuIDS BS/BE A100 |b ger |e kids | ||
| 082 | 1 | |a 004 |2 15 | |
| 084 | |a ZM 9050 |2 rvk | ||
| 084 | |a ZN 4900 |2 rvk | ||
| 084 | |a ZN 5350 |2 rvk | ||
| 100 | 1 | |a Spiro |D Hans | |
| 245 | 1 | 0 | |a CAD der Mikroelektronik |b Simulation, Layout und Testdatenerstellung |c Hans Spiro |
| 264 | 1 | |a München [etc.] |b R. Oldenbourg Verlag |c 1997 | |
| 300 | |a XIV, 411 S. |b Ill. |c 24 cm | ||
| 650 | 7 | |a Mikroelektronik |x Computer Aided Design |2 idsbb | |
| 650 | 7 | |a Computer Aided Design |x Mikroelektronik |2 idsbb | |
| 650 | 7 | |a CAD (RECHNERGESTÜTZTES ENTWERFEN UND KONSTRUIEREN) |x ger |0 (ETHUDK)000034695 |2 ethudk | |
| 650 | 7 | |a LAYOUTS/MIKROELEKTRONIK |x ger |0 (ETHUDK)000028009 |2 ethudk | |
| 650 | 7 | |a MIKROELEKTRONIK + INTEGRIERTE SCHALTUNGEN |x ger |0 (ETHUDK)000028107 |2 ethudk | |
| 650 | 7 | |a SCHALTKREISENTWURF (MIKROELEKTRONIK) |x ger |0 (ETHUDK)000047869 |2 ethudk | |
| 650 | 7 | |a TESTMUSTERGENERIERUNG (MIKROELEKTRONIK) |x ger |0 (ETHUDK)000048895 |2 ethudk | |
| 650 | 7 | |a TRANSIENTENANALYSE (ELEKTROTECHNIK) |x ger |0 (ETHUDK)000040297 |2 ethudk | |
| 691 | 7 | |B u |a MIKROELEKTRONIK + INTEGRIERTE SCHALTUNGEN |z ger |u 621.3.049.77 |2 nebis E1 | |
| 691 | 7 | |B u |a SCHALTKREISENTWURF (MIKROELEKTRONIK) |z ger |u 621.3.049.7,18 |2 nebis E1 | |
| 691 | 7 | |B u |a CAD (RECHNERGESTÜTZTES ENTWERFEN UND KONSTRUIEREN) |z ger |u 65,04.02.23.12.1 |2 nebis E1 | |
| 691 | 7 | |B u |a TRANSIENTENANALYSE (ELEKTROTECHNIK) |z ger |u 621.3.011.719,2 |2 nebis E1 | |
| 691 | 7 | |B u |a LAYOUTS/MIKROELEKTRONIK |z ger |u 621.3.049.7,16 |2 nebis E1 | |
| 691 | 7 | |B u |a TESTMUSTERGENERIERUNG (MIKROELEKTRONIK) |z ger |u 621.3.049.2,1 |2 nebis E1 | |
| 691 | 7 | |B u |a MICROÉLECTRONIQUE + CIRCUITS INTÉGRÉS |z fre |u 621.3.049.77 |2 nebis E1 | |
| 691 | 7 | |B u |a MICROELECTRONICS + INTEGRATED CIRCUITS |z eng |u 621.3.049.77 |2 nebis E1 | |
| 691 | 7 | |B u |a DESSIN DES CIRCUITS IMPRIMÉS (MICROÉLECTRONIQUE) |z fre |u 621.3.049.7,18 |2 nebis E1 | |
| 691 | 7 | |B u |a CIRCUIT DESIGN (MICROELECTRONICS) |z eng |u 621.3.049.7,18 |2 nebis E1 | |
| 691 | 7 | |B u |a CONCEPTION ASSISTÉE PAR ORDINATEUR (CAO) |z fre |u 65,04.02.23.12.1 |2 nebis E1 | |
| 691 | 7 | |B u |a CAD (COMPUTER AIDED DESIGN) |z eng |u 65,04.02.23.12.1 |2 nebis E1 | |
| 691 | 7 | |B u |a ANALYSE TRANSITOIRE (ÉLECTROTECHNIQUE) |z fre |u 621.3.011.719,2 |2 nebis E1 | |
| 691 | 7 | |B u |a TRANSIENT ANALYSIS (ELECTRICAL ENGINEERING) |z eng |u 621.3.011.719,2 |2 nebis E1 | |
| 691 | 7 | |B u |a LAYOUTS/MICROELECTRONICS |z eng |u 621.3.049.7,16 |2 nebis E1 | |
| 691 | 7 | |B u |a LAYOUTS/MICROÉLECTRONIQUE |z fre |u 621.3.049.7,16 |2 nebis E1 | |
| 691 | 7 | |B u |a TEST PATTERN GENERATIONS (MICROELECTRONICS) |z eng |u 621.3.049.2,1 |2 nebis E1 | |
| 691 | 7 | |B u |a GÉNÉRATION DE MOTIFS DE CONTRÔLE (MICROÉLECTRONIQUE) |z fre |u 621.3.049.2,1 |2 nebis E1 | |
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| 912 | 7 | |a te |2 SzZuIDS BS/BE | |
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| 949 | |B IDSBB |F A100 |b A100 |c 100FM |j UBH JM 3598 |x Akz: ba/uub-/k/309697 | ||
| 949 | |B NEBIS |F E01 |b E01 |c MG |j 428788 | ||
| 950 | |B IDSBB |P 100 |E 1- |a Spiro |D Hans | ||
| 950 | |B NEBIS |P 700 |E 1- |a Spiro |D Hans | ||
| 986 | |a SWISSBIB |b 277928818 | ||