Diffusion Resistances and Contribution of Surface Diffusion in TAME and TAEE Production Using Amberlyst-15

Verfasser / Beitragende:
[Timur Dogu, Ebru Aydin, Nezahat Boz, Kirali Murtezaoglu, Gulsen Dogu]
Ort, Verlag, Jahr:
2002
Enthalten in:
International Journal of Chemical Reactor Engineering, 1/1(2002-11-27)
Format:
Artikel (online)
ID: 378711385