Effect of CVI Temperature on the Microstructure of Nextel 480/SiO2

Verfasser / Beitragende:
[Chen Zhaofeng,, Zhang Litong,, Cheng Laifei,, Xu Yongdong,, Jin Zhihao,]
Ort, Verlag, Jahr:
2002
Enthalten in:
Science and Engineering of Composite Materials, 10/6(2002-12), 403-406
Format:
Artikel (online)
ID: 378724401