caa a22 4500 388018453 CHVBK 20180307124917.0 cr unu---uuuuu 161130e199811 xx s 000 0 eng 10.1557/JMR.1998.0414 doi S0884291400046483 pii (NATIONALLICENCE)cambridge-10.1557/JMR.1998.0414 A study on the residual stress measurement methods on chemical vapor deposition diamond films [Elektronische Daten] Diamond films were deposited on the p-type Si substrate with the hot filament chemical vapor deposition (HFCVD). Residual stresses in the films were measured in air by the laser curvature, the x-ray diffraction (XRD) dϕψ − sin2 ψ, and the Raman peak shift methods. All of the measuring methods showed similar behaviors of residual stress that changed from a compressive to a tensile stress with increasing the film thickness. However, values of residual stresses obtained through the Raman and XRD methods were 3-4 times higher than those of the curvature method. These discrepancies involved the setting of materials constants of CVD diamond film, and determination of a peak shifting on the XRD and Raman method. In order to elucidate the disparity, we measured a Young's moduli of diamond films by using the sonic resonance method. In doing so, the Raman and XRD peak shift were calibrated by bending diamond/Si beams with diamond films by a known amount, with stress levels known a priori from the beam theory, and by monitoring the peak shifts simultaneously. Results of each measuring method showed well coincidental behaviors of residual stresses which have the stress range from −0.5 GPa to +0.7 GPa, and an intrinsic stress was caused about +0.7 GPa with tensile stress. Copyright © Materials Research Society 1998 Kim Jung Geun Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, P.O. Box 305-701, Kusung-Dong 373-1, Taejon, Korea Yu Jin Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, P.O. Box 305-701, Kusung-Dong 373-1, Taejon, Korea Journal of Materials Research Cambridge University Press 13/11(1998-11), 3027-3033 0884-2914 13:11<3027 1998 13 JMR https://doi.org/10.1557/JMR.1998.0414 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1557/JMR.1998.0414 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Kim Jung Geun Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, P.O. Box 305-701, Kusung-Dong 373-1, Taejon, Korea NATIONALLICENCE 700 1- Yu Jin Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, P.O. Box 305-701, Kusung-Dong 373-1, Taejon, Korea NATIONALLICENCE 773 0- Journal of Materials Research Cambridge University Press 13/11(1998-11), 3027-3033 0884-2914 13:11<3027 1998 13 JMR CC0 http://creativecommons.org/publicdomain/zero/1.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-cambridge