caa a22 4500 388018682 CHVBK 20180307124917.0 cr unu---uuuuu 161130e199806 xx s 000 0 eng 10.1557/JMR.1998.0230 doi S0884291400044666 pii (NATIONALLICENCE)cambridge-10.1557/JMR.1998.0230 Simultaneous real-time study of initial hillocking and changes in overall stress in evaporated Al films during heating [Elektronische Daten] Optical quality Al films were evaporated by an electron beam onto Si wafers in an ultrahigh vacuum system. The as-deposited samples were radiative heated at a rate of 3 °C/s in air environment. During heating, measurements of initial hillocking and changes in overall film stress were performed simultaneously and in real time as a function of time and temperature with a specially designed optical instrument. The physical principles of this instrument are based on laser beam deflection caused by film stress induced wafer bending and partial integrated light scattering from surface roughening. The experimental results show how the initial hillocking is accompanied by changes in the overall stress and yield a very good correlation between the onset of hillock formation and the maximum change in overall stress. Copyright © Materials Research Society 1998 Kylner C. Department of Physics II - Optics, Royal Institute of Technology, S-100 44 Stockholm, Sweden, and Surface Evaluation Laboratory, Institute of Optical Research, S-100 44 Stockholm, Sweden Mattsson L. Surface Evaluation Laboratory, Institute of Optical Research, S-100 44 Stockholm, Sweden Journal of Materials Research Cambridge University Press 13/6(1998-06), 1666-1671 0884-2914 13:6<1666 1998 13 JMR https://doi.org/10.1557/JMR.1998.0230 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1557/JMR.1998.0230 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Kylner C. Department of Physics II - Optics, Royal Institute of Technology, S-100 44 Stockholm, Sweden, and Surface Evaluation Laboratory, Institute of Optical Research, S-100 44 Stockholm, Sweden NATIONALLICENCE 700 1- Mattsson L. Surface Evaluation Laboratory, Institute of Optical Research, S-100 44 Stockholm, Sweden NATIONALLICENCE 773 0- Journal of Materials Research Cambridge University Press 13/6(1998-06), 1666-1671 0884-2914 13:6<1666 1998 13 JMR CC0 http://creativecommons.org/publicdomain/zero/1.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-cambridge