caa a22 4500 388018933 CHVBK 20180307124918.0 cr unu---uuuuu 161130e199806 xx s 000 0 eng 10.1557/JMR.1998.0206 doi S0884291400044423 pii (NATIONALLICENCE)cambridge-10.1557/JMR.1998.0206 Electron microscopy study of interfacial structure and reaction of Yba2Cu3O7/Y-ZrO2 films on LaAlO3 substrates [Elektronische Daten] The detailed structure and interfacial reaction of epitaxial Yba2Cu3O7/Y-ZrO2 (YBCO/YSZ) films grown by chemical vapor deposition (CVD) on LaAlO3 (LAO) substrates are investigated by means of high-resolution electron microscopy (HREM), analytical transmission electron microscopy, and scanning transmission electron microscopy (STEM). The epitaxial relations of YBCO/YSZ/LAO are [100]YBCO // [110]YSZ // [100]LAO and (001)YBCO // (001)YSZ // (001)LAO. The optimum atomic configuration at the YSZ/LAO interface, in which oxygen is the first atomic layer on LAO, is proposed by using HREM combined with image simulation based on the atomic structure models of the interface. Near the YBCO/YSZ interface, two localized interfacial reaction products are formed: (i) a Y-rich modulated ZrO2 structure at the surface of the YSZ film, which may be caused by the diffusion of Y into the YSZ grains; (ii) an intergranular BaZrO3 phase formed by the diffusion of Ba along the columnar grain boundaries of the YSZ film during YBCO growth. Copyright © Materials Research Society 1998 Dai J. Y. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 Kaatz F. H. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 Markworth P. R. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 Buchholz D. B. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 Liu X. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 Chiou W. A. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 Chang R. P. H. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 Journal of Materials Research Cambridge University Press 13/6(1998-06), 1485-1491 0884-2914 13:6<1485 1998 13 JMR https://doi.org/10.1557/JMR.1998.0206 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1557/JMR.1998.0206 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Dai J. Y. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 NATIONALLICENCE 700 1- Kaatz F. H. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 NATIONALLICENCE 700 1- Markworth P. R. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 NATIONALLICENCE 700 1- Buchholz D. B. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 NATIONALLICENCE 700 1- Liu X. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 NATIONALLICENCE 700 1- Chiou W. A. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 NATIONALLICENCE 700 1- Chang R. P. H. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 NATIONALLICENCE 773 0- Journal of Materials Research Cambridge University Press 13/6(1998-06), 1485-1491 0884-2914 13:6<1485 1998 13 JMR CC0 http://creativecommons.org/publicdomain/zero/1.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-cambridge