caa a22 4500 388019182 CHVBK 20180307124919.0 cr unu---uuuuu 161130e199810 xx s 000 0 eng 10.1557/JMR.1998.0405 doi S0884291400046409 pii (NATIONALLICENCE)cambridge-10.1557/JMR.1998.0405 Textures of thin copper films [Elektronische Daten] The textures of thin copper films were determined quantitatively by measuring (111) pole figures with x-ray diffraction. Measurements were performed on a variety of samples, differing in copper film thickness and deposition technique, diffusion barrier material, and the presence or absence of a cap layer. Texture changes due to an annealing treatment were also recorded and correlated with stress measurements by the wafer-curvature technique. It is found that the deposition method (PVD vs CVD) has a strong effect on texture, barrier layer effects range from negligible to significant depending on the barrier material, and the effect of a cap layer is insignificant. Copyright © Materials Research Society 1998 Kuschke W-M Max-Planck-Institut für Metallforschung and Institut für Metallkunde der Universität Stuttgart, Seestr. 71, 70174 Stuttgart, Germany Kretschmann A. Max-Planck-Institut für Metallforschung and Institut für Metallkunde der Universität Stuttgart, Seestr. 71, 70174 Stuttgart, Germany Keller R-M Max-Planck-Institut für Metallforschung and Institut für Metallkunde der Universität Stuttgart, Seestr. 71, 70174 Stuttgart, Germany Vinci R. P. Department of Materials Science and Engineering, Stanford University, Stanford, California 94305-2205 Kaufmann C. TU Chemnitz-Zwickau, Fakultät für Elektrotechnik und Informationstechnik, Zentrum für Mikrotechnologien, Reichenhainer Str. 70, 09126 Chemnitz, Germany Arzt E. Max-Planck-Institut für Metallforschung and Institut für Metallkunde der Universität Stuttgart, Seestr. 71, 70174 Stuttgart, Germany Journal of Materials Research Cambridge University Press 13/10(1998-10), 2962-2968 0884-2914 13:10<2962 1998 13 JMR https://doi.org/10.1557/JMR.1998.0405 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1557/JMR.1998.0405 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Kuschke W-M Max-Planck-Institut für Metallforschung and Institut für Metallkunde der Universität Stuttgart, Seestr. 71, 70174 Stuttgart, Germany NATIONALLICENCE 700 1- Kretschmann A. Max-Planck-Institut für Metallforschung and Institut für Metallkunde der Universität Stuttgart, Seestr. 71, 70174 Stuttgart, Germany NATIONALLICENCE 700 1- Keller R-M Max-Planck-Institut für Metallforschung and Institut für Metallkunde der Universität Stuttgart, Seestr. 71, 70174 Stuttgart, Germany NATIONALLICENCE 700 1- Vinci R. P. Department of Materials Science and Engineering, Stanford University, Stanford, California 94305-2205 NATIONALLICENCE 700 1- Kaufmann C. TU Chemnitz-Zwickau, Fakultät für Elektrotechnik und Informationstechnik, Zentrum für Mikrotechnologien, Reichenhainer Str. 70, 09126 Chemnitz, Germany NATIONALLICENCE 700 1- Arzt E. Max-Planck-Institut für Metallforschung and Institut für Metallkunde der Universität Stuttgart, Seestr. 71, 70174 Stuttgart, Germany NATIONALLICENCE 773 0- Journal of Materials Research Cambridge University Press 13/10(1998-10), 2962-2968 0884-2914 13:10<2962 1998 13 JMR CC0 http://creativecommons.org/publicdomain/zero/1.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-cambridge