caa a22 4500 388019786 CHVBK 20180307124920.0 cr unu---uuuuu 161130e199804 xx s 000 0 eng 10.1557/JMR.1998.0134 doi S0884291400043715 pii (NATIONALLICENCE)cambridge-10.1557/JMR.1998.0134 Thermodynamically stable tungsten ohmic contacts to n-In0.53Ga0.47As [Elektronische Daten] Based on a thermodynamic assessment of the W-In-Ga-As quaternary system, the metal W was selected as a thermodynamically stable ohmic contact material to n-In0.53Ga0.47As. As-deposited contacts (on n ∼ 1.4 × 1018 cm−3 In0.53Ga0.47As) had average specific contact resistances of 7 × 10−7 Ω ·cm2 as measured using the transmission line model. The contact resistances remained unchanged after rapid thermal annealing at 400 °C for 1 min or at 600 °C for 1 min, and exhibited no degradation in electrical properties even after long-term annealing at 500 °C for 100 h. Transmission electron microscopic examination of the contacts showed no interfacial reaction. The present investigation demonstrates the power of thermodynamics in identifying stable ohmic contacts to multicomponent semiconductors. Copyright © Materials Research Society 1998 Chen D. Y. Lucent Technologies Microelectronics, 2525 North 12th Street, Reading, Pennsylvania 19612 Chang Y. A. Department of Materials Science and Engineering, University of Wisconsin, 1509 University Avenue, Madison, Wisconsin 53706 Swenson D. Department of Metallurgical and Materials Engineering, Michigan Technological University, 1400 Townsend Drive, Houghton, Michigan 49931 Shepherd F. R. Nortel Technology, Ottawa, Canada K1Y 4H7 Journal of Materials Research Cambridge University Press 13/4(1998-04), 959-964 0884-2914 13:4<959 1998 13 JMR https://doi.org/10.1557/JMR.1998.0134 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1557/JMR.1998.0134 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Chen D. Y. Lucent Technologies Microelectronics, 2525 North 12th Street, Reading, Pennsylvania 19612 NATIONALLICENCE 700 1- Chang Y. A. Department of Materials Science and Engineering, University of Wisconsin, 1509 University Avenue, Madison, Wisconsin 53706 NATIONALLICENCE 700 1- Swenson D. Department of Metallurgical and Materials Engineering, Michigan Technological University, 1400 Townsend Drive, Houghton, Michigan 49931 NATIONALLICENCE 700 1- Shepherd F. R. Nortel Technology, Ottawa, Canada K1Y 4H7 NATIONALLICENCE 773 0- Journal of Materials Research Cambridge University Press 13/4(1998-04), 959-964 0884-2914 13:4<959 1998 13 JMR CC0 http://creativecommons.org/publicdomain/zero/1.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-cambridge