caa a22 4500 388019832 CHVBK 20180307124921.0 cr unu---uuuuu 161130e199804 xx s 000 0 eng 10.1557/JMR.1998.0143 doi S0884291400043806 pii (NATIONALLICENCE)cambridge-10.1557/JMR.1998.0143 Microstructure of cosputter-deposited metal- and oxide-MoS2 solid lubricant thin films [Elektronische Daten] The effect of cosputtering small amounts of Ni (3%, 9%) and SbOx (20%) on the final microstructure of MoS2 lubricant thin films has been studied using a combination of scanning and transmission electron microscopy imaging, and electron and x-ray diffraction techniques. The early-growth, near-interface microstructure of both MoS2 and 3% Ni-MoS2 cosputtered films is revealed to be a mixture of (002) basal and elongated, large-size (100) and (110) edge islands. Cosputtering with 9% Ni induces a dramatic change in the microstructure, i.e., primarily basal domains with very small isolated regions of edge islands, while cosputtering with 20% SbOx produces films having no long-range order. The results are compared with and are consistent with previously published x-ray absorption fine structure data. The impact of film morphology on tribological performance is discussed. Copyright © Materials Research Society 1998 Hilton M. R. Mechanics and Materials Technology Center, The Aerospace Corporation, El Segundo, California 90245 Jayaram G. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 Marks L. D. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 Journal of Materials Research Cambridge University Press 13/4(1998-04), 1022-1032 0884-2914 13:4<1022 1998 13 JMR https://doi.org/10.1557/JMR.1998.0143 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1557/JMR.1998.0143 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Hilton M. R. Mechanics and Materials Technology Center, The Aerospace Corporation, El Segundo, California 90245 NATIONALLICENCE 700 1- Jayaram G. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 NATIONALLICENCE 700 1- Marks L. D. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 NATIONALLICENCE 773 0- Journal of Materials Research Cambridge University Press 13/4(1998-04), 1022-1032 0884-2914 13:4<1022 1998 13 JMR CC0 http://creativecommons.org/publicdomain/zero/1.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-cambridge