caa a22 4500 388020067 CHVBK 20180307124921.0 cr unu---uuuuu 161130e199804 xx s 000 0 eng 10.1557/JMR.1998.0108 doi S0884291400043454 pii (NATIONALLICENCE)cambridge-10.1557/JMR.1998.0108 Low temperature solid-state epitaxy of LiNbO3 films by a dipping-pyrolysis process using Li-trifluoroacetate [Elektronische Daten] Epitaxially grown LiNbO3 thin films were prepared on sapphire(012) (R-plane) substrates by a dipping-pyrolysis process using two kinds of lithium sources, i.e., Li-2-ethylhexanoate and Li-trifluoroacetate, which are pyrolyzed in air to Li2CO3 and LiF, respectively. Crystallization temperature and alignment of LiNbO3 films on sapphire(012) were found to depend greatly on the Li sources. Dominantly [100]-oriented epitaxial LiNbO3 films were crystallized at around 600 °C using 2-ethylhexanoate, whereas dominantly [012]-oriented epitaxial LiNbO3 films resulted at a temperature as low as 400 °C using trifluoroacetate. Copyright © Materials Research Society 1998 Manabe T. National Institute of Materials and Chemical Research, Higashi 1-1, Tsukuba, Ibaraki 305-8565, Japan Yamaguchi I. National Institute of Materials and Chemical Research, Higashi 1-1, Tsukuba, Ibaraki 305-8565, Japan Kondo W. National Institute of Materials and Chemical Research, Higashi 1-1, Tsukuba, Ibaraki 305-8565, Japan Kumagai T. National Institute of Materials and Chemical Research, Higashi 1-1, Tsukuba, Ibaraki 305-8565, Japan Mizuta S. National Institute of Materials and Chemical Research, Higashi 1-1, Tsukuba, Ibaraki 305-8565, Japan Journal of Materials Research Cambridge University Press 13/4(1998-04), 834-836 0884-2914 13:4<834 1998 13 JMR https://doi.org/10.1557/JMR.1998.0108 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1557/JMR.1998.0108 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Manabe T. National Institute of Materials and Chemical Research, Higashi 1-1, Tsukuba, Ibaraki 305-8565, Japan NATIONALLICENCE 700 1- Yamaguchi I. National Institute of Materials and Chemical Research, Higashi 1-1, Tsukuba, Ibaraki 305-8565, Japan NATIONALLICENCE 700 1- Kondo W. National Institute of Materials and Chemical Research, Higashi 1-1, Tsukuba, Ibaraki 305-8565, Japan NATIONALLICENCE 700 1- Kumagai T. National Institute of Materials and Chemical Research, Higashi 1-1, Tsukuba, Ibaraki 305-8565, Japan NATIONALLICENCE 700 1- Mizuta S. National Institute of Materials and Chemical Research, Higashi 1-1, Tsukuba, Ibaraki 305-8565, Japan NATIONALLICENCE 773 0- Journal of Materials Research Cambridge University Press 13/4(1998-04), 834-836 0884-2914 13:4<834 1998 13 JMR CC0 http://creativecommons.org/publicdomain/zero/1.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-cambridge