caa a22 4500 388020385 CHVBK 20180307124922.0 cr unu---uuuuu 161130e199809 xx s 000 0 eng 10.1557/JMR.1998.0367 doi S0884291400046033 pii (NATIONALLICENCE)cambridge-10.1557/JMR.1998.0367 Texture Evolution in Si/SiC Layered Structures Deposited on Si(001) by Chemical Vapor Deposition [Elektronische Daten] Texture evolution in Si/SiC multilayers deposited by atmospheric pressure chemical vapor deposition on carbonized Si(001) substrates was investigated using x-ray diffraction and transmission electron microscopy. SiC layers were epitaxial and (001)-oriented. Si layers deposited on the SiC exhibited a columnar structure with predominantly (110) orientation which could be related to the nucleation. Orientational relationships were Si[111] ║ SiC[110] and Si[112] ║ SiC[110]. Also, a low density of (112)-oriented columns was present. Extensive twinning on the vertical {111} planes within the Si columns led to domains of hexagonal stacking up to 10 nm in size with the presence of 2H-Si and 4H-Si. Subsequent SiC layer growth on the (110)-oriented Si layer resulted in a (110)-oriented SiC layer if the Si layer was carbonized prior to growth. Copyright © Materials Research Society 1998 Björketun L-O Thin Film Physics Division, Department of Physics and Measurement Technology, Linköoping University, S-581 83 Linköping, Sweden Hultman L. Thin Film Physics Division, Department of Physics and Measurement Technology, Linköoping University, S-581 83 Linköping, Sweden Kordina O. Thin Film Physics Division, Department of Physics and Measurement Technology, Linköoping University, S-581 83 Linköping, Sweden Sundgren J-E Thin Film Physics Division, Department of Physics and Measurement Technology, Linköoping University, S-581 83 Linköping, Sweden Journal of Materials Research Cambridge University Press 13/9(1998-09), 2632-2642 0884-2914 13:9<2632 1998 13 JMR https://doi.org/10.1557/JMR.1998.0367 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1557/JMR.1998.0367 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Björketun L-O Thin Film Physics Division, Department of Physics and Measurement Technology, Linköoping University, S-581 83 Linköping, Sweden NATIONALLICENCE 700 1- Hultman L. Thin Film Physics Division, Department of Physics and Measurement Technology, Linköoping University, S-581 83 Linköping, Sweden NATIONALLICENCE 700 1- Kordina O. Thin Film Physics Division, Department of Physics and Measurement Technology, Linköoping University, S-581 83 Linköping, Sweden NATIONALLICENCE 700 1- Sundgren J-E Thin Film Physics Division, Department of Physics and Measurement Technology, Linköoping University, S-581 83 Linköping, Sweden NATIONALLICENCE 773 0- Journal of Materials Research Cambridge University Press 13/9(1998-09), 2632-2642 0884-2914 13:9<2632 1998 13 JMR CC0 http://creativecommons.org/publicdomain/zero/1.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-cambridge