caa a22 4500 388020776 CHVBK 20180307124923.0 cr unu---uuuuu 161130e199803 xx s 000 0 eng 10.1557/JMR.1998.0068 doi S0884291400043053 pii (NATIONALLICENCE)cambridge-10.1557/JMR.1998.0068 Surface precipitates on single crystal LiNbO3 after dry-etching by CHF3 plasma [Elektronische Daten] The CHF3 electron cyclotron resonance (ECR) plasma etched LiNbO3 (LN) surface was analyzed chemically and crystallographically to investigate the dry-etch machining process for LN crystal, which was recently needed to obtain broader-band optical modulators. The etched surface was entirely covered with amorphous-like precipitates having ~70 nm diameter. These precipitates (or a part of them) were thought to be LiF from Auger electron and x-ray photoelectron spectroscopy. The results indicated that the LiF was formed and remained on the etched surface while the Nb was almost completely removed. Copyright © Materials Research Society 1998 Shima Kaori Advanced Materials Research Division, New Technology Research Laboratories, Sumitomo Osaka Cement Co., Ltd., 585 Toyotomi-cho, Funabashi-shi, Chiba 274, Japan Mitsugi Naoki Optoelectronics Research Division, New Technology Research Laboratories, Sumitomo Osaka Cement Co., Ltd.,585 Toyotomi-cho, Funabashi-shi, Chiba 274, Japan Nagata Hirotoshi Optoelectronics Research Division, New Technology Research Laboratories, Sumitomo Osaka Cement Co., Ltd.,585 Toyotomi-cho, Funabashi-shi, Chiba 274, Japan Journal of Materials Research Cambridge University Press 13/3(1998-03), 527-529 0884-2914 13:3<527 1998 13 JMR https://doi.org/10.1557/JMR.1998.0068 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1557/JMR.1998.0068 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Shima Kaori Advanced Materials Research Division, New Technology Research Laboratories, Sumitomo Osaka Cement Co., Ltd., 585 Toyotomi-cho, Funabashi-shi, Chiba 274, Japan NATIONALLICENCE 700 1- Mitsugi Naoki Optoelectronics Research Division, New Technology Research Laboratories, Sumitomo Osaka Cement Co., Ltd.,585 Toyotomi-cho, Funabashi-shi, Chiba 274, Japan NATIONALLICENCE 700 1- Nagata Hirotoshi Optoelectronics Research Division, New Technology Research Laboratories, Sumitomo Osaka Cement Co., Ltd.,585 Toyotomi-cho, Funabashi-shi, Chiba 274, Japan NATIONALLICENCE 773 0- Journal of Materials Research Cambridge University Press 13/3(1998-03), 527-529 0884-2914 13:3<527 1998 13 JMR CC0 http://creativecommons.org/publicdomain/zero/1.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-cambridge