caa a22 4500 388021160 CHVBK 20180307124924.0 cr unu---uuuuu 161130e199801 xx s 000 0 eng 10.1557/JMR.1998.0009 doi S0884291400042461 pii (NATIONALLICENCE)cambridge-10.1557/JMR.1998.0009 Role of rapid photothermal processing in environmentally conscious semiconductor manufacturing [Elektronische Daten] Compliance with the increasingly stringent environmental laws will force the phasing out of conventional methods for the manufacture of all semiconductor devices. Development of processes with the highest possible material and energy efficiencies is the heart of the present ecological preservation efforts. Besides other benefits, rapid isothermal processing (RIP) also uses less energy than furnace processing. Further increase of material and energy efficiencies is possible by using rapid photothermal processing. Central to this method is the use of quantum photoeffects in conventional RIP systems. This approach can be consolidated with advanced chemical vapor deposition methods that further lower the wastages leading to systems that can give significant improvements over those presently used. Key experimental results and possible future directions are presented. Copyright © Materials Research Society 1998 Sharangpani R. Department of Electrical and Computer Engineering, Clemson University, Clemson, South Carolina 29634-0915 Singh R. Department of Electrical and Computer Engineering and Materials Science and Engineering Program, Clemson University, Clemson, South Carolina 29634-0915 Journal of Materials Research Cambridge University Press 13/1(1998-01), 61-67 0884-2914 13:1<61 1998 13 JMR https://doi.org/10.1557/JMR.1998.0009 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1557/JMR.1998.0009 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Sharangpani R. Department of Electrical and Computer Engineering, Clemson University, Clemson, South Carolina 29634-0915 NATIONALLICENCE 700 1- Singh R. Department of Electrical and Computer Engineering and Materials Science and Engineering Program, Clemson University, Clemson, South Carolina 29634-0915 NATIONALLICENCE 773 0- Journal of Materials Research Cambridge University Press 13/1(1998-01), 61-67 0884-2914 13:1<61 1998 13 JMR CC0 http://creativecommons.org/publicdomain/zero/1.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-cambridge