caa a22 4500 388021926 CHVBK 20180307124926.0 cr unu---uuuuu 161130e199807 xx s 000 0 eng 10.1557/JMR.1998.0272 doi S0884291400045088 pii (NATIONALLICENCE)cambridge-10.1557/JMR.1998.0272 Stress evolution in passivated thin films of Cu on silica substrates [Elektronische Daten] Stresses supported by thin films of Cu passivated by SiOx have been measured upon thermal cycling. Very high stresses have been found, approaching 1 GPa in the thinnest (40 nm) films. Strengthening beyond yield occurs upon both cooling and heating, indicative of strong strain hardening in the Cu. The hardening continues down to at least 77 K. The yielding behavior of the Cu films has been characterized by a kinematic constitutive law, with exceptional strain hardening and a conventional temperature-dependent yield strength. The physical basis for this behavior is ascribed to confined shear bands in the Cu that induce large back stress. Transmission electron microscopy reveals aligned dislocations, which seemingly dictate the inelastic deformations in the shear bands. Copyright © Materials Research Society 1998 Shen Y-L Departments of Materials Science and Mechanical Engineering, M.I.T., Cambridge, Massachusetts 02139 Suresh S. Departments of Materials Science and Mechanical Engineering, M.I.T., Cambridge, Massachusetts 02139 He M. Y. M.I.T.-Harvard Program on Modeling of Materials, Division of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138 Bagchi A. M.I.T.-Harvard Program on Modeling of Materials, Division of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138 Kienzle O. Max Planck Institut f¨ur Metallforschung, Seestrasse 92, Stuttgart, Germany Rühle M. Max Planck Institut f¨ur Metallforschung, Seestrasse 92, Stuttgart, Germany Evans A. G. M.I.T.-Harvard Program of Modeling of Materials, Division of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138 Journal of Materials Research Cambridge University Press 13/7(1998-07), 1928-1937 0884-2914 13:7<1928 1998 13 JMR https://doi.org/10.1557/JMR.1998.0272 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1557/JMR.1998.0272 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Shen Y-L Departments of Materials Science and Mechanical Engineering, M.I.T., Cambridge, Massachusetts 02139 NATIONALLICENCE 700 1- Suresh S. Departments of Materials Science and Mechanical Engineering, M.I.T., Cambridge, Massachusetts 02139 NATIONALLICENCE 700 1- He M. Y. M.I.T.-Harvard Program on Modeling of Materials, Division of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138 NATIONALLICENCE 700 1- Bagchi A. M.I.T.-Harvard Program on Modeling of Materials, Division of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138 NATIONALLICENCE 700 1- Kienzle O. Max Planck Institut f¨ur Metallforschung, Seestrasse 92, Stuttgart, Germany NATIONALLICENCE 700 1- Rühle M. Max Planck Institut f¨ur Metallforschung, Seestrasse 92, Stuttgart, Germany NATIONALLICENCE 700 1- Evans A. G. M.I.T.-Harvard Program of Modeling of Materials, Division of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138 NATIONALLICENCE 773 0- Journal of Materials Research Cambridge University Press 13/7(1998-07), 1928-1937 0884-2914 13:7<1928 1998 13 JMR CC0 http://creativecommons.org/publicdomain/zero/1.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-cambridge