caa a22 4500 388021942 CHVBK 20180307124927.0 cr unu---uuuuu 161130e199807 xx s 000 0 eng 10.1557/JMR.1998.0240 doi S0884291400044769 pii (NATIONALLICENCE)cambridge-10.1557/JMR.1998.0240 Novel in situ production of smooth diamond films [Elektronische Daten] We have developed a unique method to produce smooth diamond films using a modified microwave plasma process system. This method consists of sequential in situ deposition and planarization in an electron cyclotron resonance plasma system. Diamond films were deposited to a thickness of 3.0 μm in this system at a pressure of 1.000 Torr from gas mixtures of methanol and hydrogen. Deposition was followed by planarization using a two-grid ion beam extraction process with a pure oxygen plasma at 10 mTorr. The average roughness of the diamond films so produced was as low as 30 nm, which was a factor of two lower than that of the as-deposited diamond films. Copyright © Materials Research Society 1998 Gilbert Donald R. Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 Lee Dong-Gu Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 Singh Rajiv K. Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 Journal of Materials Research Cambridge University Press 13/7(1998-07), 1735-1737 0884-2914 13:7<1735 1998 13 JMR https://doi.org/10.1557/JMR.1998.0240 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1557/JMR.1998.0240 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Gilbert Donald R. Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 NATIONALLICENCE 700 1- Lee Dong-Gu Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 NATIONALLICENCE 700 1- Singh Rajiv K. Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 NATIONALLICENCE 773 0- Journal of Materials Research Cambridge University Press 13/7(1998-07), 1735-1737 0884-2914 13:7<1735 1998 13 JMR CC0 http://creativecommons.org/publicdomain/zero/1.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-cambridge