caa a22 4500 388021969 CHVBK 20180307124927.0 cr unu---uuuuu 161130e199807 xx s 000 0 eng 10.1557/JMR.1998.0273 doi S088429140004509X pii (NATIONALLICENCE)cambridge-10.1557/JMR.1998.0273 Atomic force microscope investigation of the thermal stability of thin TiSi2 films [Elektronische Daten] The thermal stability of TiSi2 films on Si has been studied using the atomic force microscope (AFM). Changes in the surface roughness, film morphology, and sheet resistance were monitored during a series of rapid thermal annealing treatments. A linear increase of the root-mean-square (rms) roughness with time was observed during the early stages of degradation, in agreement with a surface diffusion model of thermal grooving, followed by an apparent saturation roughness that was attributed to the effective rupture of the film. Copyright © Materials Research Society 1998 Amorsolo Alberto V. Department of Mechanical Engineering, University of Rochester, Rochester, New York 14627 Funkenbusch Paul D. Department of Mechanical Engineering, University of Rochester, Rochester, New York 14627 Kadin Alan M. Department of Electrical Engineering, University of Rochester, Rochester, New York 14627 Journal of Materials Research Cambridge University Press 13/7(1998-07), 1938-1949 0884-2914 13:7<1938 1998 13 JMR https://doi.org/10.1557/JMR.1998.0273 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1557/JMR.1998.0273 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Amorsolo Alberto V. Department of Mechanical Engineering, University of Rochester, Rochester, New York 14627 NATIONALLICENCE 700 1- Funkenbusch Paul D. Department of Mechanical Engineering, University of Rochester, Rochester, New York 14627 NATIONALLICENCE 700 1- Kadin Alan M. Department of Electrical Engineering, University of Rochester, Rochester, New York 14627 NATIONALLICENCE 773 0- Journal of Materials Research Cambridge University Press 13/7(1998-07), 1938-1949 0884-2914 13:7<1938 1998 13 JMR CC0 http://creativecommons.org/publicdomain/zero/1.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-cambridge