caa a22 4500 388022221 CHVBK 20180307124927.0 cr unu---uuuuu 161130e199808 xx s 000 0 eng 10.1557/JMR.1998.0300 doi S0884291400045362 pii (NATIONALLICENCE)cambridge-10.1557/JMR.1998.0300 Chemical interaction between nitrogen and iron in silica glasses via sequential ion-implantation [Elektronische Daten] Silica glass plates (Corning 7940 excimer grade) were implanted sequentially with N+ at 52 keV to different doses, ranging from 0 to 1.2 × 1017 ions cm−2, and then with Fe+ at 160 keV to 6 × 1016 ions cm−2 at room temperature and 4 µA cm−2. The intensity of ferromagnetic magnetic resonance (FMR) absorption and the magnetization calculated by the angular dependence of the FMR field reach maxima at an N/Fe atomic ratio ∼0.2. Two peaks due to Fe 2p3/2 electron are observed at 707.2 ± 0.2 and 710.9 ± 0.2 eV in the x-ray photoelectron spectra. The intensity of the former relative to the latter decreases with increasing the N dose. The conversion electron Mössbauer spectrum reveals the formation of superparamagnetic iron nitride as well as the existence of Fe2+ and Fe3+ in silica when implanting N+ to 7.5 × 1015 ions cm−2 and then Fe+ to 6 × 1016 ions cm−2 at N/Fe = 0.125. These results suggest that sequential ion-implantation of N+ and Fe+ produces iron nitride in silica glasses. Copyright © Materials Research Society 1998 Isobe Tetsuhiko Department of Applied Chemistry, Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Yokohama 223, Japan Toriyama Tamotsu Department of Energy Science and Engineering, Musashi Institute of Technology, Tamazutsumi 1-28-1, Setagaya-ku, Tokyo 158, Japan Weeks Robert A. Department of Applied and Engineering Science, Vanderbilt University, Nashville, Tennessee 37235 Zuhr Raymond A. Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 Journal of Materials Research Cambridge University Press 13/8(1998-08), 2144-2150 0884-2914 13:8<2144 1998 13 JMR https://doi.org/10.1557/JMR.1998.0300 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1557/JMR.1998.0300 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Isobe Tetsuhiko Department of Applied Chemistry, Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Yokohama 223, Japan NATIONALLICENCE 700 1- Toriyama Tamotsu Department of Energy Science and Engineering, Musashi Institute of Technology, Tamazutsumi 1-28-1, Setagaya-ku, Tokyo 158, Japan NATIONALLICENCE 700 1- Weeks Robert A. Department of Applied and Engineering Science, Vanderbilt University, Nashville, Tennessee 37235 NATIONALLICENCE 700 1- Zuhr Raymond A. Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 NATIONALLICENCE 773 0- Journal of Materials Research Cambridge University Press 13/8(1998-08), 2144-2150 0884-2914 13:8<2144 1998 13 JMR CC0 http://creativecommons.org/publicdomain/zero/1.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-cambridge