caa a22 4500 388022302 CHVBK 20180307124927.0 cr unu---uuuuu 161130e199808 xx s 000 0 eng 10.1557/JMR.1998.0294 doi S0884291400045301 pii (NATIONALLICENCE)cambridge-10.1557/JMR.1998.0294 Microstructural control of amorphous silicon films crystallized using an excimer laser [Elektronische Daten] A technique for microstructural control of excimer laser-annealed silicon thin films on SiO2 substrates has been developed. By using single-crystal photolithographically etched silicon seed wafers in intimate contact with the silicon films, we have shown that it is possible to spatially control nucleation. Transmission electron micrographs show the resultant microstructure to consist of large (∼1 µm) grain structures in the area surrounding the seed contact, with distinct organization not previously observed. A theoretical discussion is presented to explain the observed phenomena. Also, results from a numerical simulation are given which outline the effects of the seed wafer on the resultant microstructure of the laser-annealed film, as compared to nonseeded areas. Copyright © Materials Research Society 1998 Viatella John Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 Singh Rajiv K. Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 Journal of Materials Research Cambridge University Press 13/8(1998-08), 2105-2109 0884-2914 13:8<2105 1998 13 JMR https://doi.org/10.1557/JMR.1998.0294 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1557/JMR.1998.0294 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Viatella John Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 NATIONALLICENCE 700 1- Singh Rajiv K. Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 NATIONALLICENCE 773 0- Journal of Materials Research Cambridge University Press 13/8(1998-08), 2105-2109 0884-2914 13:8<2105 1998 13 JMR CC0 http://creativecommons.org/publicdomain/zero/1.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-cambridge