caa a22 4500 38802268X CHVBK 20180307124928.0 cr unu---uuuuu 161130e199805 xx s 000 0 eng 10.1557/JMR.1998.0196 doi S0884291400044320 pii (NATIONALLICENCE)cambridge-10.1557/JMR.1998.0196 High efficiency photoresist-free lithography of UO3 patterns from amorphous films of uranyl complexes [Elektronische Daten] The solid state photochemistry of uranyl carboxylate complexes is presented with the purpose of developing methods for optical lithography of uranium oxide films. These complexes of the general formula, UO2(OOCR)2 (R = i-C3H7, C5H11, CH2C6H5, CH2OC2H5, C2H4OC2H5), were all photosensitive as thin amorphous films. The primary photochemical reaction for each of these complexes was the extrusion of a CO2 from the ligand and the production of radicals which initiated a chain reaction. The nature of this chain reaction was dependent upon the identity of the organic substituents, R. In some cases the chain reaction required a photochemical step while others were entirely thermal in nature. Of importance are the potentially high quantum yields which can be associated with thermal chain reactions. Some of the systems presented here exhibit quantum yields in excess of 1. This process was shown to be compatible with optical lithography by the patterning of the uranium oxide product on silicon surfaces. Copyright © Materials Research Society 1998 Gao M. Department of Chemistry, Simon Fraser University, Burnaby, British Columbia, Canada V5A 1S6 Hill Ross H. Department of Chemistry, Simon Fraser University, Burnaby, British Columbia, Canada V5A 1S6 Journal of Materials Research Cambridge University Press 13/5(1998-05), 1379-1389 0884-2914 13:5<1379 1998 13 JMR https://doi.org/10.1557/JMR.1998.0196 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1557/JMR.1998.0196 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Gao M. Department of Chemistry, Simon Fraser University, Burnaby, British Columbia, Canada V5A 1S6 NATIONALLICENCE 700 1- Hill Ross H. Department of Chemistry, Simon Fraser University, Burnaby, British Columbia, Canada V5A 1S6 NATIONALLICENCE 773 0- Journal of Materials Research Cambridge University Press 13/5(1998-05), 1379-1389 0884-2914 13:5<1379 1998 13 JMR CC0 http://creativecommons.org/publicdomain/zero/1.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-cambridge