caa a22 4500 388022876 CHVBK 20180307124929.0 cr unu---uuuuu 161130e199805 xx s 000 0 eng 10.1557/JMR.1998.0174 doi S0884291400044101 pii (NATIONALLICENCE)cambridge-10.1557/JMR.1998.0174 Two critical thicknesses in the preferred orientation of TiN thin film [Elektronische Daten] The preferred orientation of the TiN film grown by sputter-deposition was studied by the cross-sectional TEM. The preferred orientation was changed from the (200) through the (110), and then finally to the (111) with the film thickness. The cross-sectional microstructure also shows that the film consists of three layers which are all columnar structure. The (111) preferred orientation was observed in the top layer, and the (110) in the middle layer, and finally the (200) in the bottom layer. It is very surprising that the (110) preferred orientation could be observed in a medium thickness region and there are two kinds of critical thicknesses. These results surely show the strong dependence of the change in the preferred orientation on the strain energy in TiN thin films. Copyright © Materials Research Society 1998 Oh U. C. Department of Materials Science and Engineering, Pohang University of Science -784, Korea Je Jung Ho Department of Materials Science and Engineering, Pohang University of Science -784, Korea Lee Jeong Y. Department of Materials Science and Engineering, Korea Advanced Institute of Science ' 1998 Journal of Materials Research Cambridge University Press 13/5(1998-05), 1225-1229 0884-2914 13:5<1225 1998 13 JMR https://doi.org/10.1557/JMR.1998.0174 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1557/JMR.1998.0174 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Oh U. C. Department of Materials Science and Engineering, Pohang University of Science -784, Korea NATIONALLICENCE 700 1- Je Jung Ho Department of Materials Science and Engineering, Pohang University of Science -784, Korea NATIONALLICENCE 700 1- Lee Jeong Y. Department of Materials Science and Engineering, Korea Advanced Institute of Science ' 1998 NATIONALLICENCE 773 0- Journal of Materials Research Cambridge University Press 13/5(1998-05), 1225-1229 0884-2914 13:5<1225 1998 13 JMR CC0 http://creativecommons.org/publicdomain/zero/1.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-cambridge