caa a22 4500 388023023 CHVBK 20180307124929.0 cr unu---uuuuu 161130e199805 xx s 000 0 eng 10.1557/JMR.1998.0180 doi S0884291400044162 pii (NATIONALLICENCE)cambridge-10.1557/JMR.1998.0180 Thickness dependence of microstructural evolution of ZnO films deposited by rf magnetron sputtering [Elektronische Daten] The microstructural evolution, including preferred orientation and surface morphology, of ZnO films deposited by rf magnetron sputtering was investigated with increasing film thickness. Preferred orientation of the ZnO films changed from (0002) → (1011) → (1120) and fine and dense columnar grains also changed to large elongated grains with increasing thickness. Such selective texture growth was explained with an effect of highly energetic species bombardment on the growing film surface. The relationship between preferred orientation change and microstructural evolution was also discussed. Copyright © Materials Research Society 1998 Lee Yong Eui Inter-University Semiconductor Research Center (ISRC) and School of Material Science and Engineering, Seoul National University, Seoul 151-742, Korea Kim Young Jin Department of Elec. and Advanced Materials Engineering, Kyonggi University, Suwon 440-760, Korea Kim Hyeong Joon Inter-University Semiconductor Research Center (ISRC) and School of Material Science and Engineering, Seoul National University, Seoul 151-742, Korea Journal of Materials Research Cambridge University Press 13/5(1998-05), 1260-1265 0884-2914 13:5<1260 1998 13 JMR https://doi.org/10.1557/JMR.1998.0180 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1557/JMR.1998.0180 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Lee Yong Eui Inter-University Semiconductor Research Center (ISRC) and School of Material Science and Engineering, Seoul National University, Seoul 151-742, Korea NATIONALLICENCE 700 1- Kim Young Jin Department of Elec. and Advanced Materials Engineering, Kyonggi University, Suwon 440-760, Korea NATIONALLICENCE 700 1- Kim Hyeong Joon Inter-University Semiconductor Research Center (ISRC) and School of Material Science and Engineering, Seoul National University, Seoul 151-742, Korea NATIONALLICENCE 773 0- Journal of Materials Research Cambridge University Press 13/5(1998-05), 1260-1265 0884-2914 13:5<1260 1998 13 JMR CC0 http://creativecommons.org/publicdomain/zero/1.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-cambridge