caa a22 4500 388074965 CHVBK 20180307125158.0 cr unu---uuuuu 161130e199908 xx s 000 0 eng 10.1557/S0883769400052878 doi S0883769400052878 pii (NATIONALLICENCE)cambridge-10.1557/S0883769400052878 Self-Assembled Patterning of Ultrathin Silicides by Local Oxidation [Elektronische Daten] Most microfabrication techniques employ masks to transfer the desired microstructure onto a wafer using ultraviolet light, x-rays, electrons, or ions for the projection of the structures. Generally, photoresist processing and etching follow to form the final structures. In all cases, the facilities necessary to perform these processes grow increasingly more complex as the feature size of the structures diminishes, and these processes face their practical or economic limits at dimensions of about 50 nm. Thus alternative approaches are under investigation, including different self-assembly techniques. They require no costly facilities and no masks with nanometer structures, and they promise high throughput, since the patterning is directly achieved by a physical or chemical process. Self-assembled monolayers of long-chain organic molecules are the most widely studied examples, where chemisorption and spontaneous self-ordering of the molecules are observed on appropriate substrates. Another interesting example is island-ordering, laterally or in a vertical direction, during epitaxial growth. The lattice-mismatched islands tend to nucleate preferentially on top of each other when separated by a thin spacer layer, due to the associated strain field. Another approach is the use of specific stressor layers on the surface to obtain alignment of buried precipitates along the stressor lines. However, the main challenges of all self-assembly techniques are precise control of the dimensions of the structures and reproducibility. Copyright © Materials Research Society 1999 Mantl S. Zhao Q.T. Kabius B. MRS Bulletin Cambridge University Press 24/8(1999-08), 31-35 0883-7694 24:8<31 1999 24 MRS https://doi.org/10.1557/S0883769400052878 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1557/S0883769400052878 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Mantl S. NATIONALLICENCE 700 1- Zhao Q.T. NATIONALLICENCE 700 1- Kabius B. NATIONALLICENCE 773 0- MRS Bulletin Cambridge University Press 24/8(1999-08), 31-35 0883-7694 24:8<31 1999 24 MRS CC0 http://creativecommons.org/publicdomain/zero/1.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-cambridge