caa a22 4500 397570341 CHVBK 20180308164839.0 cr unu---uuuuu 161202e199606 xx s 000 0 eng 10.1093/oxfordjournals.jmicro.a023438 doi (NATIONALLICENCE)oxford-10.1093/oxfordjournals.jmicro.a023438 High Resolution X-Ray Elemental Mapping Using 300-kV Field-Emission TEM [Elektronische Daten] [Hisaya Murakoshi, Hiroshi Kakibayashi, Tomonobu Tsuchiya] A high-resolution X-ray elemental mapping system has been developed for use with a 300-kV Reid-emission TEM. The optimum illuminating condition for elemental mapping is estimated by calculation of the electron optic characteristics where a spot size of 0.5 nm or less for probe currents between 0.07 nA and 0.7 nA is obtained. This condition is applied for elemental mapping of an InP/InGaAs superlattice. The layers with 1.2 nm to 9.7 nm thickness are clearly observed and a 0.6-nm layer is indistinctly observed. Thus, it is confirmed that the X-ray elemental mapping with high-resolution is successfully attained. © 1996 Oxford University Press Letters nationallicence field-emission TEM nationallicence superlattice nationallicence X-ray elemental mapping nationallicence Murakoshi Hisaya Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo, 185 Japan aut Kakibayashi Hiroshi Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo, 185 Japan aut Tsuchiya Tomonobu Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo, 185 Japan aut Microscopy Oxford University Press 45/3(1996-06), 236-238 0022-0744 45:3<236 1996 45 jmicro https://doi.org/10.1093/oxfordjournals.jmicro.a023438 text/html Onlinezugriff via DOI 1 article jats NATIONALLICENCE 856 40 https://doi.org/10.1093/oxfordjournals.jmicro.a023438 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Murakoshi Hisaya Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo, 185 Japan aut NATIONALLICENCE 700 1- Kakibayashi Hiroshi Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo, 185 Japan aut NATIONALLICENCE 700 1- Tsuchiya Tomonobu Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo, 185 Japan aut NATIONALLICENCE 773 0- Microscopy Oxford University Press 45/3(1996-06), 236-238 0022-0744 45:3<236 1996 45 jmicro Metadata rights reserved CC BY-NC-4.0 http://creativecommons.org/licenses/by-nc/4.0 nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-oxford