Study of ultrathin iron silicide films grown by solid phase epitaxy on the Si(001) surface

Verfasser / Beitragende:
[V. Balashev, V. Korobtsov, T. Pisarenko, E. Chusovitin, K. Galkin]
Ort, Verlag, Jahr:
2010
Enthalten in:
Physics of the Solid State, 52/2(2010-02-01), 397-403
Format:
Artikel (online)
ID: 445112697