caa a22 4500 445303913 CHVBK 20180317142606.0 cr unu---uuuuu 170323e20100201xx s 000 0 eng 10.1007/s12274-010-1013-5 doi (NATIONALLICENCE)springer-10.1007/s12274-010-1013-5 Lithography-free fabrication of high quality substrate-supported and freestanding graphene devices [Elektronische Daten] [Wenzhong Bao, Gang Liu, Zeng Zhao, Hang Zhang, Dong Yan, Aparna Deshpande, Brian LeRoy, Chun Lau] We present a lithography-free technique for fabrication of clean, high quality graphene devices. This technique is based on evaporation through hard Si shadow masks, and eliminates contaminants introduced by lithographical processes. We demonstrate that devices fabricated by this technique have significantly higher mobility values than those obtained by standard electron beam lithography. To obtain ultra-high mobility devices, we extend this technique to fabricate suspended graphene samples with mobilities as high as 120 000 cm2/(V·s). Tsinghua University Press and Springer-Verlag Berlin Heidelberg, 2010 Suspended graphene nationallicence shadow mask nationallicence mobility nationallicence lithography-free nationallicence e-beam evaporation nationallicence Bao Wenzhong Department of Physics and Astronomy, University of California, 92521, Riverside, CA, USA aut Liu Gang Department of Physics and Astronomy, University of California, 92521, Riverside, CA, USA aut Zhao Zeng Department of Physics and Astronomy, University of California, 92521, Riverside, CA, USA aut Zhang Hang Department of Physics and Astronomy, University of California, 92521, Riverside, CA, USA aut Yan Dong Center for Nanoscale Science and Engineering, University of California, 92521, Riverside, CA, USA aut Deshpande Aparna Department of Physics, University of Arizona, 85721, Tucson, AZ, USA aut LeRoy Brian Department of Physics, University of Arizona, 85721, Tucson, AZ, USA aut Lau Chun Department of Physics and Astronomy, University of California, 92521, Riverside, CA, USA aut Nano Research Tsinghua Press 3/2(2010-02-01), 98-102 1998-0124 3:2<98 2010 3 12274 https://doi.org/10.1007/s12274-010-1013-5 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s12274-010-1013-5 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Bao Wenzhong Department of Physics and Astronomy, University of California, 92521, Riverside, CA, USA aut NATIONALLICENCE 700 1- Liu Gang Department of Physics and Astronomy, University of California, 92521, Riverside, CA, USA aut NATIONALLICENCE 700 1- Zhao Zeng Department of Physics and Astronomy, University of California, 92521, Riverside, CA, USA aut NATIONALLICENCE 700 1- Zhang Hang Department of Physics and Astronomy, University of California, 92521, Riverside, CA, USA aut NATIONALLICENCE 700 1- Yan Dong Center for Nanoscale Science and Engineering, University of California, 92521, Riverside, CA, USA aut NATIONALLICENCE 700 1- Deshpande Aparna Department of Physics, University of Arizona, 85721, Tucson, AZ, USA aut NATIONALLICENCE 700 1- LeRoy Brian Department of Physics, University of Arizona, 85721, Tucson, AZ, USA aut NATIONALLICENCE 700 1- Lau Chun Department of Physics and Astronomy, University of California, 92521, Riverside, CA, USA aut NATIONALLICENCE 773 0- Nano Research Tsinghua Press 3/2(2010-02-01), 98-102 1998-0124 3:2<98 2010 3 12274 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer