caa a22 4500 445303972 CHVBK 20180317142607.0 cr unu---uuuuu 170323e20100201xx s 000 0 eng 10.1007/s12274-010-1015-3 doi (NATIONALLICENCE)springer-10.1007/s12274-010-1015-3 Crystallographically selective nanopatterning of graphene on SiO2 [Elektronische Daten] [Péter Nemes-Incze, Gábor Magda, Katalin Kamarás, László Biró] Graphene has many advantageous properties, but its lack of an electronic band gap makes this two-dimensional material impractical for many nanoelectronic applications, for example, field-effect transistors. This problem can be circumvented by opening up a confinement-induced gap, through the patterning of graphene into ribbons having widths of a few nanometres. The electronic properties of such ribbons depend on both their size and the crystallographic orientation of the ribbon edges. Therefore, etching processes that are able to differentiate between the zigzag and armchair type edge terminations of graphene are highly sought after. In this contribution we show that such an anisotropic, dry etching reaction is possible and we use it to obtain graphene ribbons with zigzag edges. We demonstrate that the starting positions for the carbon removal reaction can be tailored at will with precision. Tsinghua University Press and Springer-Verlag Berlin Heidelberg, 2010 Graphene nationallicence atomic force microscopy (AFM) nationallicence etching nationallicence nanoribbon nationallicence zigzag nationallicence Nemes-Incze Péter Research Institute for Technical Physics and Materials Science, PO Box 49, H-1525, Budapest, Hungary aut Magda Gábor Budapest University of Technology and Economics (BME), PO Box 91, H-1521, Budapest, Hungary aut Kamarás Katalin Research Institute for Solid State Physics and Optics, Hungarian Academy of Sciences, PO Box 49, H-1525, Budapest, Hungary aut Biró László Research Institute for Technical Physics and Materials Science, PO Box 49, H-1525, Budapest, Hungary aut Nano Research Tsinghua Press 3/2(2010-02-01), 110-116 1998-0124 3:2<110 2010 3 12274 https://doi.org/10.1007/s12274-010-1015-3 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s12274-010-1015-3 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Nemes-Incze Péter Research Institute for Technical Physics and Materials Science, PO Box 49, H-1525, Budapest, Hungary aut NATIONALLICENCE 700 1- Magda Gábor Budapest University of Technology and Economics (BME), PO Box 91, H-1521, Budapest, Hungary aut NATIONALLICENCE 700 1- Kamarás Katalin Research Institute for Solid State Physics and Optics, Hungarian Academy of Sciences, PO Box 49, H-1525, Budapest, Hungary aut NATIONALLICENCE 700 1- Biró László Research Institute for Technical Physics and Materials Science, PO Box 49, H-1525, Budapest, Hungary aut NATIONALLICENCE 773 0- Nano Research Tsinghua Press 3/2(2010-02-01), 110-116 1998-0124 3:2<110 2010 3 12274 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer