caa a22 4500 445371978 CHVBK 20180317142950.0 cr unu---uuuuu 170323e20110301xx s 000 0 eng 10.1007/s00340-010-4193-5 doi (NATIONALLICENCE)springer-10.1007/s00340-010-4193-5 Laser-produced plasma EUV source based on tin-rich, thin-layertargets [Elektronische Daten] [R. Rakowski, J. Mikołajczyk, A. Bartnik, H. Fiedorowicz, F. de Gaufridy de Dortan, R. Jarocki, J. Kostecki, M. Szczurek, P. Wachulak] In this paper a new approach to a laser-produced plasma EUV source based on a tin target is presented. Athin layer of pure tin and composite layers consisting of Sn with Si, SiO and LiF are investigated. The target composed of several thin layers produces less debris than the other targets and provides a conversion efficiency (CE) in the 13.5-nm±1% band at least comparable to the CE for the pure tin slab target. The largest CE was observed for the target composed of a mixture of Sn and LiF, due to the fact that lithium, similarly to tin, is a strong emitter at 13.5nm. The Author(s), 2010 Rakowski R. Institute of Optoelectronics, Military University of Technology, 2 Gen. Sylwestra Kaliskiego St., 00-908, Warsaw, Poland aut Mikołajczyk J. Institute of Optoelectronics, Military University of Technology, 2 Gen. Sylwestra Kaliskiego St., 00-908, Warsaw, Poland aut Bartnik A. Institute of Optoelectronics, Military University of Technology, 2 Gen. Sylwestra Kaliskiego St., 00-908, Warsaw, Poland aut Fiedorowicz H. Institute of Optoelectronics, Military University of Technology, 2 Gen. Sylwestra Kaliskiego St., 00-908, Warsaw, Poland aut de Gaufridy de Dortan F. Service des Photons, Atomes et Molecules, CEA-Saclay, 91191, Gif-sur-Yvette Cedex, France aut Jarocki R. Institute of Optoelectronics, Military University of Technology, 2 Gen. Sylwestra Kaliskiego St., 00-908, Warsaw, Poland aut Kostecki J. Institute of Optoelectronics, Military University of Technology, 2 Gen. Sylwestra Kaliskiego St., 00-908, Warsaw, Poland aut Szczurek M. Institute of Optoelectronics, Military University of Technology, 2 Gen. Sylwestra Kaliskiego St., 00-908, Warsaw, Poland aut Wachulak P. Institute of Optoelectronics, Military University of Technology, 2 Gen. Sylwestra Kaliskiego St., 00-908, Warsaw, Poland aut Applied Physics B Springer-Verlag 102/3(2011-03-01), 559-567 0946-2171 102:3<559 2011 102 340 https://doi.org/10.1007/s00340-010-4193-5 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s00340-010-4193-5 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Rakowski R. Institute of Optoelectronics, Military University of Technology, 2 Gen. Sylwestra Kaliskiego St., 00-908, Warsaw, Poland aut NATIONALLICENCE 700 1- Mikołajczyk J. Institute of Optoelectronics, Military University of Technology, 2 Gen. Sylwestra Kaliskiego St., 00-908, Warsaw, Poland aut NATIONALLICENCE 700 1- Bartnik A. Institute of Optoelectronics, Military University of Technology, 2 Gen. Sylwestra Kaliskiego St., 00-908, Warsaw, Poland aut NATIONALLICENCE 700 1- Fiedorowicz H. Institute of Optoelectronics, Military University of Technology, 2 Gen. Sylwestra Kaliskiego St., 00-908, Warsaw, Poland aut NATIONALLICENCE 700 1- de Gaufridy de Dortan F. Service des Photons, Atomes et Molecules, CEA-Saclay, 91191, Gif-sur-Yvette Cedex, France aut NATIONALLICENCE 700 1- Jarocki R. Institute of Optoelectronics, Military University of Technology, 2 Gen. Sylwestra Kaliskiego St., 00-908, Warsaw, Poland aut NATIONALLICENCE 700 1- Kostecki J. Institute of Optoelectronics, Military University of Technology, 2 Gen. Sylwestra Kaliskiego St., 00-908, Warsaw, Poland aut NATIONALLICENCE 700 1- Szczurek M. Institute of Optoelectronics, Military University of Technology, 2 Gen. Sylwestra Kaliskiego St., 00-908, Warsaw, Poland aut NATIONALLICENCE 700 1- Wachulak P. Institute of Optoelectronics, Military University of Technology, 2 Gen. Sylwestra Kaliskiego St., 00-908, Warsaw, Poland aut NATIONALLICENCE 773 0- Applied Physics B Springer-Verlag 102/3(2011-03-01), 559-567 0946-2171 102:3<559 2011 102 340 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer