caa a22 4500 445372303 CHVBK 20180317142951.0 cr unu---uuuuu 170323e20110301xx s 000 0 eng 10.1007/s00340-010-4194-4 doi (NATIONALLICENCE)springer-10.1007/s00340-010-4194-4 Ionization yield of two-step photoionization process in an optically thick atomic medium of barium [Elektronische Daten] [B. Jana, A. Majumder, P. Kathar, A. Das, V. Mago] The kinetics of a two-step photoionization process in optically thick atomic medium of barium (Ba) is studied using the rate equation approach. In the first step, Ba atoms get resonantly excited by laser radiation from their ground state to an intermediate excited state and subsequently are ionized in the second step by another laser radiation. The absorption of exciting radiation is taken into account along its propagation direction (optically thick). However, the medium is assumed to be optically thin for the ionizing radiation. A numerical simulation is done to estimate the ionization yield for time-varying Gaussian shaped laser pulses. The required energy density of the laser pulse to saturate the excitation transition throughout the thick medium is calculated. The effect of optical delay between the laser beams on the ionization yield is simulated. The calculated ionization yield from the simulation is compared with the measured values. Springer-Verlag, 2010 Jana B. Laser & Plasma Technology Division, Bhabha Atomic Research Centre, 400085, Mumbai, India aut Majumder A. Laser & Plasma Technology Division, Bhabha Atomic Research Centre, 400085, Mumbai, India aut Kathar P. Laser & Plasma Technology Division, Bhabha Atomic Research Centre, 400085, Mumbai, India aut Das A. Laser & Plasma Technology Division, Bhabha Atomic Research Centre, 400085, Mumbai, India aut Mago V. Laser & Plasma Technology Division, Bhabha Atomic Research Centre, 400085, Mumbai, India aut Applied Physics B Springer-Verlag 102/4(2011-03-01), 841-849 0946-2171 102:4<841 2011 102 340 https://doi.org/10.1007/s00340-010-4194-4 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s00340-010-4194-4 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Jana B. Laser & Plasma Technology Division, Bhabha Atomic Research Centre, 400085, Mumbai, India aut NATIONALLICENCE 700 1- Majumder A. Laser & Plasma Technology Division, Bhabha Atomic Research Centre, 400085, Mumbai, India aut NATIONALLICENCE 700 1- Kathar P. Laser & Plasma Technology Division, Bhabha Atomic Research Centre, 400085, Mumbai, India aut NATIONALLICENCE 700 1- Das A. Laser & Plasma Technology Division, Bhabha Atomic Research Centre, 400085, Mumbai, India aut NATIONALLICENCE 700 1- Mago V. Laser & Plasma Technology Division, Bhabha Atomic Research Centre, 400085, Mumbai, India aut NATIONALLICENCE 773 0- Applied Physics B Springer-Verlag 102/4(2011-03-01), 841-849 0946-2171 102:4<841 2011 102 340 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer