caa a22 4500 445826797 CHVBK 20180317145301.0 cr unu---uuuuu 170323e20110901xx s 000 0 eng 10.1007/s10854-011-0307-z doi (NATIONALLICENCE)springer-10.1007/s10854-011-0307-z Investigations on printed elastic resistors containing carbon nanotubes [Elektronische Daten] [Marcin Słoma, Małgorzata Jakubowska, Andrzej Kolek, Krzysztof Mleczko, Piotr Ptak, Adam Stadler, Zbigniew Zawiślak, Anna Młożniak] This paper presents the results of authors investigations on elaboration of a new thick film composition filled with carbon nanotubes (CNTs). The polymer composition consists of polymer vehicle, which is the solution of organic resin in certain combination of solvents, and functional phase—carbon nanotubes well dispersed in the vehicle. The pastes were applied with screen-printing on several substrates and temperature cured. The properties of obtained layers were characterized. Series of samples were prepared with different amount of CNTs to evaluate electrical properties. Changes in resistance were investigated during periodic mechanical and temperature stresses, realized through cyclical bending and rapid temperature change. Tensometric effect was also investigated. Investigations have proved that polymer composites based on carbon nanotubes exhibit high resilience to stress factors. Resistance change in function of temperature was also investigated to evaluate temperature coefficient of resistance (TCR). All this aspects are important for elastic resistors fabrication in printed electronics microcircuits. Resistance and noise measurements in cryostats have also been involved. 1/f type noise has been observed. Noise intensity, calculated in decade frequency bands, rises significantly with increasing temperature. Activation energies of thermally activated noise sources (TANS) have been revealed using low-frequency noise spectroscopy. Relatively large value of negative TCR has been obtained from resistance versus temperature curve. Calculated dimensionless sensitivity is similar to that observed in cryogenic temperature sensors. However, bulk noise intensity of resistive layer is larger than obtained for lead containing RuO2 based resistive layers. The Author(s), 2011 Słoma Marcin Institute of Metrology and Biomedical Engineering, Faculty of Mechatronics, Warsaw University of Technology, Św. A. Boboli 8, 02-525, Warsaw, Poland aut Jakubowska Małgorzata Institute of Metrology and Biomedical Engineering, Faculty of Mechatronics, Warsaw University of Technology, Św. A. Boboli 8, 02-525, Warsaw, Poland aut Kolek Andrzej Department of Electronics Fundamentals, Faculty of Electrical and Computer Engineering, Rzeszów University of Technology, W. Pola 2, 35-959, Rzeszów, Poland aut Mleczko Krzysztof Department of Electronics Fundamentals, Faculty of Electrical and Computer Engineering, Rzeszów University of Technology, W. Pola 2, 35-959, Rzeszów, Poland aut Ptak Piotr Department of Electronics Fundamentals, Faculty of Electrical and Computer Engineering, Rzeszów University of Technology, W. Pola 2, 35-959, Rzeszów, Poland aut Stadler Adam Department of Electronics Fundamentals, Faculty of Electrical and Computer Engineering, Rzeszów University of Technology, W. Pola 2, 35-959, Rzeszów, Poland aut Zawiślak Zbigniew Department of Electronics Fundamentals, Faculty of Electrical and Computer Engineering, Rzeszów University of Technology, W. Pola 2, 35-959, Rzeszów, Poland aut Młożniak Anna Institute of Electronic Materials Technology, Wólczyńska 133, 01-919, Warsaw, Poland aut Journal of Materials Science: Materials in Electronics Springer US; http://www.springer-ny.com 22/9(2011-09-01), 1321-1329 0957-4522 22:9<1321 2011 22 10854 https://doi.org/10.1007/s10854-011-0307-z text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s10854-011-0307-z text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Słoma Marcin Institute of Metrology and Biomedical Engineering, Faculty of Mechatronics, Warsaw University of Technology, Św. A. Boboli 8, 02-525, Warsaw, Poland aut NATIONALLICENCE 700 1- Jakubowska Małgorzata Institute of Metrology and Biomedical Engineering, Faculty of Mechatronics, Warsaw University of Technology, Św. A. Boboli 8, 02-525, Warsaw, Poland aut NATIONALLICENCE 700 1- Kolek Andrzej Department of Electronics Fundamentals, Faculty of Electrical and Computer Engineering, Rzeszów University of Technology, W. Pola 2, 35-959, Rzeszów, Poland aut NATIONALLICENCE 700 1- Mleczko Krzysztof Department of Electronics Fundamentals, Faculty of Electrical and Computer Engineering, Rzeszów University of Technology, W. Pola 2, 35-959, Rzeszów, Poland aut NATIONALLICENCE 700 1- Ptak Piotr Department of Electronics Fundamentals, Faculty of Electrical and Computer Engineering, Rzeszów University of Technology, W. Pola 2, 35-959, Rzeszów, Poland aut NATIONALLICENCE 700 1- Stadler Adam Department of Electronics Fundamentals, Faculty of Electrical and Computer Engineering, Rzeszów University of Technology, W. Pola 2, 35-959, Rzeszów, Poland aut NATIONALLICENCE 700 1- Zawiślak Zbigniew Department of Electronics Fundamentals, Faculty of Electrical and Computer Engineering, Rzeszów University of Technology, W. Pola 2, 35-959, Rzeszów, Poland aut NATIONALLICENCE 700 1- Młożniak Anna Institute of Electronic Materials Technology, Wólczyńska 133, 01-919, Warsaw, Poland aut NATIONALLICENCE 773 0- Journal of Materials Science: Materials in Electronics Springer US; http://www.springer-ny.com 22/9(2011-09-01), 1321-1329 0957-4522 22:9<1321 2011 22 10854 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer