caa a22 4500 445826908 CHVBK 20180317145302.0 cr unu---uuuuu 170323e20110901xx s 000 0 eng 10.1007/s10854-011-0330-0 doi (NATIONALLICENCE)springer-10.1007/s10854-011-0330-0 Electrodeposition and properties of nanocrystalline ZnO films prepared in the presence of anionic surfactant SDS and ionic liquid 1-butyl-3-methylimidazolium methylsulfate [Elektronische Daten] [V. Vidhya, J. Vatsala Rani, A. Ratheesh Kumar, R. Thangamuthu, K. Murali, M. Jayachandran] ZnO thin films were potentiostatically electrodeposited on transparent tin oxide conducting glass substrates at −1.0V (vs. Ag/AgCl) in the presence of anionic surfactant, sodium dodecyl sulphate (SDS) and hydrophobic ionic liquid, 1-butyl-3-methylimidazolium methylsulfate [bmim][CH3SO4]. X-ray diffraction (XRD) investigation confirm the formation of nanocrystalline and stoichiometric ZnO thin films. Scanning electron microscopy (SEM) results reveal that the grain size of the deposited ZnO film is reduced from 85 to 28nm when small amount of ionic liquid is added to the deposition bath. Photoluminescence study at room temperature shows a clear absorption edge in the ultra violet (UV) region confirming the high quality, nanocrystalline and stoichiometric nature of the deposited ZnO films. Springer Science+Business Media, LLC, 2011 Vidhya V. Electrochemical Materials Science Division, CSIR-Central Electrochemical Research Institute, 630 006, Karaikudi, Tamilnadu, India aut Vatsala Rani J. Fluoro Organics Division, CSIR-Indian Institute of Chemical Technology, Uppal Road, 500 607, Hyderabad, India aut Ratheesh Kumar A. Central Instrumentation Facility, CSIR-Central Electrochemical Research Institute, Karaikudi, Tamilnadu, India aut Thangamuthu R. Electrochemical Materials Science Division, CSIR-Central Electrochemical Research Institute, 630 006, Karaikudi, Tamilnadu, India aut Murali K. Electrochemical Materials Science Division, CSIR-Central Electrochemical Research Institute, 630 006, Karaikudi, Tamilnadu, India aut Jayachandran M. Electrochemical Materials Science Division, CSIR-Central Electrochemical Research Institute, 630 006, Karaikudi, Tamilnadu, India aut Journal of Materials Science: Materials in Electronics Springer US; http://www.springer-ny.com 22/9(2011-09-01), 1460-1465 0957-4522 22:9<1460 2011 22 10854 https://doi.org/10.1007/s10854-011-0330-0 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s10854-011-0330-0 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Vidhya V. Electrochemical Materials Science Division, CSIR-Central Electrochemical Research Institute, 630 006, Karaikudi, Tamilnadu, India aut NATIONALLICENCE 700 1- Vatsala Rani J. Fluoro Organics Division, CSIR-Indian Institute of Chemical Technology, Uppal Road, 500 607, Hyderabad, India aut NATIONALLICENCE 700 1- Ratheesh Kumar A. Central Instrumentation Facility, CSIR-Central Electrochemical Research Institute, Karaikudi, Tamilnadu, India aut NATIONALLICENCE 700 1- Thangamuthu R. Electrochemical Materials Science Division, CSIR-Central Electrochemical Research Institute, 630 006, Karaikudi, Tamilnadu, India aut NATIONALLICENCE 700 1- Murali K. Electrochemical Materials Science Division, CSIR-Central Electrochemical Research Institute, 630 006, Karaikudi, Tamilnadu, India aut NATIONALLICENCE 700 1- Jayachandran M. Electrochemical Materials Science Division, CSIR-Central Electrochemical Research Institute, 630 006, Karaikudi, Tamilnadu, India aut NATIONALLICENCE 773 0- Journal of Materials Science: Materials in Electronics Springer US; http://www.springer-ny.com 22/9(2011-09-01), 1460-1465 0957-4522 22:9<1460 2011 22 10854 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer