caa a22 4500 445827602 CHVBK 20180317145304.0 cr unu---uuuuu 170323e20111201xx s 000 0 eng 10.1007/s10854-011-0366-1 doi (NATIONALLICENCE)springer-10.1007/s10854-011-0366-1 Morphology, structure, and magnetic properties of electrodeposited Ni films obtained from different pH solutions [Elektronische Daten] [M. Boubatra, A. Azizi, G. Schmerber, A. Dinia] Nanocrystalline nickel (Ni) films were obtained by electrodeposition from chloride aqueous solution with different pH values. The influence of electrolyte pH on the morphological, structural, and magnetic properties is studied, using scanning electron microscopy (SEM), X-ray diffraction (XRD), and alternating gradient force magnetometry (AGFM) techniques. SEM studies revealed a granular and compact structure of the surface of the electrodeposited Ni layers, and the variation of film roughness with bath pH is established. XRD analysis gives evidence of strongly textured Ni films along the (111) direction, with the face-centered cubic (fcc) structure for all baths pH. Magnetic properties such as coercivity, remanence, saturation magnetization, and squareness showed strong dependence on the baths pH and crystallite size. High coercivity was attributed to the presence of the small crystallite size of deposits. The properties of the deposit are greatly influenced by the solution pH. Springer Science+Business Media, LLC, 2011 Boubatra M. Laboratoire de Chimie, Ingénierie Moléculaire et Nanostructures, Université F. Abbas de Sétif, 19000, Sétif, Algeria aut Azizi A. Laboratoire de Chimie, Ingénierie Moléculaire et Nanostructures, Université F. Abbas de Sétif, 19000, Sétif, Algeria aut Schmerber G. UMR 7504 CNRS, UDS-ECPM, Institut de Physique et Chimie des Matériaux de Strasbourg, 23 rue du Loess, B. P. 43, 67034, Strasbourg Cedex 2, France aut Dinia A. UMR 7504 CNRS, UDS-ECPM, Institut de Physique et Chimie des Matériaux de Strasbourg, 23 rue du Loess, B. P. 43, 67034, Strasbourg Cedex 2, France aut Journal of Materials Science: Materials in Electronics Springer US; http://www.springer-ny.com 22/12(2011-12-01), 1804-1809 0957-4522 22:12<1804 2011 22 10854 https://doi.org/10.1007/s10854-011-0366-1 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s10854-011-0366-1 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Boubatra M. Laboratoire de Chimie, Ingénierie Moléculaire et Nanostructures, Université F. Abbas de Sétif, 19000, Sétif, Algeria aut NATIONALLICENCE 700 1- Azizi A. Laboratoire de Chimie, Ingénierie Moléculaire et Nanostructures, Université F. Abbas de Sétif, 19000, Sétif, Algeria aut NATIONALLICENCE 700 1- Schmerber G. UMR 7504 CNRS, UDS-ECPM, Institut de Physique et Chimie des Matériaux de Strasbourg, 23 rue du Loess, B. P. 43, 67034, Strasbourg Cedex 2, France aut NATIONALLICENCE 700 1- Dinia A. UMR 7504 CNRS, UDS-ECPM, Institut de Physique et Chimie des Matériaux de Strasbourg, 23 rue du Loess, B. P. 43, 67034, Strasbourg Cedex 2, France aut NATIONALLICENCE 773 0- Journal of Materials Science: Materials in Electronics Springer US; http://www.springer-ny.com 22/12(2011-12-01), 1804-1809 0957-4522 22:12<1804 2011 22 10854 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer