caa a22 4500 445828919 CHVBK 20180317145307.0 cr unu---uuuuu 170323e20110201xx s 000 0 eng 10.1007/s10854-010-0111-1 doi (NATIONALLICENCE)springer-10.1007/s10854-010-0111-1 Nanoimprint glass-like carbon molds fabricated with ECR oxygen ion beams using polysiloxane oxide mask [Elektronische Daten] [S. Kiyohara, S. Araki, Y. Kurashima, Y. Taguchi, Y. Sugiyama, Y. Omata] We have investigated the nanofabrication for glass-like carbon molds with electron cyclotron resonance oxygen ion beam etching technologies using polysiloxane [-R2SiO-]n as an electron beam mask and a room-temperature imprint resist material. The maximum etching selectivity of polysiloxane film against glass-like carbon was 27, which was obtained with ion energy of 400eV. It was found that the optimum etching time to fabricate dots of 500nm in height was 5min, which was explored according to the computer simulation. The glass-like carbon molds with square pole and cylinder dots were fabricated with 500nm in width and diameter, respectively. The optimum imprinting pressure and its depth obtained after the press for 5min were 0.5MPa and 0.5μm, respectively. We carried out the room-temperature nanoimprint lithography process using glass-like carbon molds. The resulting width of imprinted polysiloxane patterns was obtained in good agreement with that of the mold. Springer Science+Business Media, LLC, 2010 Kiyohara S. Electric and Control System Engineering Course, Faculty of Advanced Engineering, Maizuru National College of Technology, 234 Aza Shiroya, 625-8511, Maizuru, Kyoto, Japan aut Araki S. Electric and Control System Engineering Course, Faculty of Advanced Engineering, Maizuru National College of Technology, 234 Aza Shiroya, 625-8511, Maizuru, Kyoto, Japan aut Kurashima Y. Department of Mechanical Systems Engineering, University of Yamanashi, 4-3-11 Takeda, 400-8511, Kofu, Yamanashi, Japan aut Taguchi Y. Application and Technical Section, ELIONIX INC, 3-7-6 Motoyokohama, 192-0063, Hachioji, Tokyo, Japan aut Sugiyama Y. Application and Technical Section, ELIONIX INC, 3-7-6 Motoyokohama, 192-0063, Hachioji, Tokyo, Japan aut Omata Y. Application and Technical Section, ELIONIX INC, 3-7-6 Motoyokohama, 192-0063, Hachioji, Tokyo, Japan aut Journal of Materials Science: Materials in Electronics Springer US; http://www.springer-ny.com 22/2(2011-02-01), 183-188 0957-4522 22:2<183 2011 22 10854 https://doi.org/10.1007/s10854-010-0111-1 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s10854-010-0111-1 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Kiyohara S. Electric and Control System Engineering Course, Faculty of Advanced Engineering, Maizuru National College of Technology, 234 Aza Shiroya, 625-8511, Maizuru, Kyoto, Japan aut NATIONALLICENCE 700 1- Araki S. Electric and Control System Engineering Course, Faculty of Advanced Engineering, Maizuru National College of Technology, 234 Aza Shiroya, 625-8511, Maizuru, Kyoto, Japan aut NATIONALLICENCE 700 1- Kurashima Y. Department of Mechanical Systems Engineering, University of Yamanashi, 4-3-11 Takeda, 400-8511, Kofu, Yamanashi, Japan aut NATIONALLICENCE 700 1- Taguchi Y. Application and Technical Section, ELIONIX INC, 3-7-6 Motoyokohama, 192-0063, Hachioji, Tokyo, Japan aut NATIONALLICENCE 700 1- Sugiyama Y. Application and Technical Section, ELIONIX INC, 3-7-6 Motoyokohama, 192-0063, Hachioji, Tokyo, Japan aut NATIONALLICENCE 700 1- Omata Y. Application and Technical Section, ELIONIX INC, 3-7-6 Motoyokohama, 192-0063, Hachioji, Tokyo, Japan aut NATIONALLICENCE 773 0- Journal of Materials Science: Materials in Electronics Springer US; http://www.springer-ny.com 22/2(2011-02-01), 183-188 0957-4522 22:2<183 2011 22 10854 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer