caa a22 4500 445858990 CHVBK 20180317145437.0 cr unu---uuuuu 170323e20110301xx s 000 0 eng 10.1007/s10946-011-9196-0 doi (NATIONALLICENCE)springer-10.1007/s10946-011-9196-0 Enhancing near-field photolithography by surface plasmon polaritons excited from negative-refractive-index nanofilms [Elektronische Daten] [Y. Zhuang, Y. Zhang, H. Zhu] We report a novel method for enhancing near-field nanophotolithography using negative-refractive-index slabs. In our method, a negative-refractive-index-metal film (NIF) is attached to the plane surface of an aplanatic solid immersion lens (SIL), and the polymer layer is coated on the negative-refractive-index film. The intensity of the transmitted light is enhanced by the surface plasmon polaritons excited in the NIF-polymer composite layer. The numerical results based on the vector diffraction theory show that under the illumination of the SIL-NIF-polymer composite by a sharp focused radially polarized beam, the composite configuration under investigation can substantially increase the spot intensity, suppress the spot expansion along the distance from the interface, and improve the depth of focus, in comparison with conventional focusing systems using bare SILs. In the case where a photoresist film is placed near the composite configuration, a subtle deep-etching pattern with high resolution can be achieved. Springer Science+Business Media, Inc., 2011 surface plasmon polaritons nationallicence near-field photolithography nationallicence vector diffraction nationallicence Zhuang Y. Department of Physics and Electronic Information, Wenzhou University, 325035, Wenzhou, China aut Zhang Y. Department of Physics and Electronic Information, Wenzhou University, 325035, Wenzhou, China aut Zhu H. Department of Physics and Electronic Information, Wenzhou University, 325035, Wenzhou, China aut Journal of Russian Laser Research Springer US; http://www.springer-ny.com 32/2(2011-03-01), 120-124 1071-2836 32:2<120 2011 32 10946 https://doi.org/10.1007/s10946-011-9196-0 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s10946-011-9196-0 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Zhuang Y. Department of Physics and Electronic Information, Wenzhou University, 325035, Wenzhou, China aut NATIONALLICENCE 700 1- Zhang Y. Department of Physics and Electronic Information, Wenzhou University, 325035, Wenzhou, China aut NATIONALLICENCE 700 1- Zhu H. Department of Physics and Electronic Information, Wenzhou University, 325035, Wenzhou, China aut NATIONALLICENCE 773 0- Journal of Russian Laser Research Springer US; http://www.springer-ny.com 32/2(2011-03-01), 120-124 1071-2836 32:2<120 2011 32 10946 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer