caa a22 4500 445867752 CHVBK 20180317145503.0 cr unu---uuuuu 170323e20110101xx s 000 0 eng 10.1140/epjd/e2010-00264-7 doi (NATIONALLICENCE)springer-10.1140/epjd/e2010-00264-7 The morphology of tin cluster assembled films and the effect of nitrogen [Elektronische Daten] [T. F. Watson, D. Belić, P. Y. Convers, E. J. Boyd, S. A. Brown] Abstract.: Thin films produced by depositing tin clusters with sizes between 5 and 10nm onto silicon nitride substrates were found to be highly coalesced resulting in grains with sizes ~30nm. Exposing the clusters to nitrogen before they were deposited significantly reduced the coalescence between them and resulted in granular films where the clusters mostly retained their shape. This is due to a small amount of tin nitride forming in the clusters. The coalesced and granular films were used to fabricate tin oxide gas sensors. This was done by depositing the two types of films onto silicon nitride chips and then oxidising them by baking at 250 °C for 24h. It was found that the sensors composed of uncoalesced clusters were much more sensitive to hydrogen. This was attributed to the smaller grain size and the larger surface area of the granular films. EDP Sciences, SIF, Springer-Verlag Berlin Heidelberg, 2010 Watson T. F. The MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Physics and Astronomy, University of Canterbury, Private bag 4800, Christchurch, New Zealand aut Belić D. The MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Physics and Astronomy, University of Canterbury, Private bag 4800, Christchurch, New Zealand aut Convers P. Y. The MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Physics and Astronomy, University of Canterbury, Private bag 4800, Christchurch, New Zealand aut Boyd E. J. The MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Physics and Astronomy, University of Canterbury, Private bag 4800, Christchurch, New Zealand aut Brown S. A. The MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Physics and Astronomy, University of Canterbury, Private bag 4800, Christchurch, New Zealand aut The European Physical Journal D Springer-Verlag 61/1(2011-01-01), 81-85 1434-6060 61:1<81 2011 61 10053 https://doi.org/10.1140/epjd/e2010-00264-7 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1140/epjd/e2010-00264-7 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Watson T. F. The MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Physics and Astronomy, University of Canterbury, Private bag 4800, Christchurch, New Zealand aut NATIONALLICENCE 700 1- Belić D. The MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Physics and Astronomy, University of Canterbury, Private bag 4800, Christchurch, New Zealand aut NATIONALLICENCE 700 1- Convers P. Y. The MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Physics and Astronomy, University of Canterbury, Private bag 4800, Christchurch, New Zealand aut NATIONALLICENCE 700 1- Boyd E. J. The MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Physics and Astronomy, University of Canterbury, Private bag 4800, Christchurch, New Zealand aut NATIONALLICENCE 700 1- Brown S. A. The MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Physics and Astronomy, University of Canterbury, Private bag 4800, Christchurch, New Zealand aut NATIONALLICENCE 773 0- The European Physical Journal D Springer-Verlag 61/1(2011-01-01), 81-85 1434-6060 61:1<81 2011 61 10053 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer