caa a22 4500 463211669 CHVBK 20180405153142.0 cr unu---uuuuu 170326e20070901xx s 000 0 eng 10.1007/s00339-007-4023-8 doi (NATIONALLICENCE)springer-10.1007/s00339-007-4023-8 Influence of process parameters on the distribution of single shot correlation coefficients obtained by correlating LIB-spectra [Elektronische Daten] [M. Lentjes, K. Dickmann, J. Meijer] Laser induced breakdown spectra can be seen as fingerprints of a material. The reproducibility of the measurements depends on several parameters. Linear correlation analysis is one method to compare spectra with a reference spectrum. When capturing n spectra of a material under the same condition and correlating the spectra with the same reference spectrum, the result leads to n correlation coefficients. The distribution of the correlation coefficients depends on the applied parameter settings. This paper presents a systematic study of the influence of different process parameters on the variance and mean of correlation coefficients. The results are presented as correlation coefficient distributions versus setting for each investigated variable. The investigated variables are: pulse energy, delay time, integration time, grating groove density, object lens distance deviation and crater depth. The results indicate that the researched parameters have an indirect and/or direct influence on the distribution of correlation coefficients. Springer-Verlag, 2007 Lentjes M. Laser Center University of Applied Sciences Muenster (LFM), Stegerwaldstrasse 39, 48565, Steinfurt, Germany aut Dickmann K. Laser Center University of Applied Sciences Muenster (LFM), Stegerwaldstrasse 39, 48565, Steinfurt, Germany aut Meijer J. Applied Laser Technology, University of Twente, P.O. Box 217, 7500AE, Enschede, The Netherlands aut Applied Physics A Springer-Verlag 88/4(2007-09-01), 661-666 0947-8396 88:4<661 2007 88 339 https://doi.org/10.1007/s00339-007-4023-8 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s00339-007-4023-8 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Lentjes M. Laser Center University of Applied Sciences Muenster (LFM), Stegerwaldstrasse 39, 48565, Steinfurt, Germany aut NATIONALLICENCE 700 1- Dickmann K. Laser Center University of Applied Sciences Muenster (LFM), Stegerwaldstrasse 39, 48565, Steinfurt, Germany aut NATIONALLICENCE 700 1- Meijer J. Applied Laser Technology, University of Twente, P.O. Box 217, 7500AE, Enschede, The Netherlands aut NATIONALLICENCE 773 0- Applied Physics A Springer-Verlag 88/4(2007-09-01), 661-666 0947-8396 88:4<661 2007 88 339 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer