caa a22 4500 463212940 CHVBK 20180405153147.0 cr unu---uuuuu 170326e20071101xx s 000 0 eng 10.1007/s00339-007-4183-6 doi (NATIONALLICENCE)springer-10.1007/s00339-007-4183-6 Magnetoresistance of nanocrystalline Co-AlN films [Elektronische Daten] [Meifang Li, Ji Shi, Yoshio Nakamura, Ronghai Yu] Co-Al-N films with different compositions were deposited by a two-facing target magnetron sputtering method for use as precursor films in the fabrication of magnetoresistive Co-AlN granular films by post-deposition annealing. It is found that the nitrogen flow ratio during sputtering deposition strongly affects the magnetic and electrical properties of Co-AlN films. In the present work, there is an optimum nitrogen flow ratio at which maximum saturation magnetizations and MR ratio (4.6%) are obtained for the annealed film. Such a film also has very high resistivity, of the order of 107μΩ cm. Another important feature of the film is that both Co and AlN are in a crystalline state, which may confer better thermal ability compared with granular films having amorphous matrix. Springer-Verlag, 2007 Li Meifang Department of Materials Science and Engineering, Tsinghua University, 100084, Beijing, P.R. China aut Shi Ji Department of Metallurgy and Ceramics Science, Tokyo Institute of Technology, Meguro-ku, 2-12-1, 152-8552, Tokyo, Japan aut Nakamura Yoshio Department of Metallurgy and Ceramics Science, Tokyo Institute of Technology, Meguro-ku, 2-12-1, 152-8552, Tokyo, Japan aut Yu Ronghai Department of Materials Science and Engineering, Tsinghua University, 100084, Beijing, P.R. China aut Applied Physics A Springer-Verlag 89/3(2007-11-01), 807-812 0947-8396 89:3<807 2007 89 339 https://doi.org/10.1007/s00339-007-4183-6 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s00339-007-4183-6 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Li Meifang Department of Materials Science and Engineering, Tsinghua University, 100084, Beijing, P.R. China aut NATIONALLICENCE 700 1- Shi Ji Department of Metallurgy and Ceramics Science, Tokyo Institute of Technology, Meguro-ku, 2-12-1, 152-8552, Tokyo, Japan aut NATIONALLICENCE 700 1- Nakamura Yoshio Department of Metallurgy and Ceramics Science, Tokyo Institute of Technology, Meguro-ku, 2-12-1, 152-8552, Tokyo, Japan aut NATIONALLICENCE 700 1- Yu Ronghai Department of Materials Science and Engineering, Tsinghua University, 100084, Beijing, P.R. China aut NATIONALLICENCE 773 0- Applied Physics A Springer-Verlag 89/3(2007-11-01), 807-812 0947-8396 89:3<807 2007 89 339 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer