caa a22 4500 463214110 CHVBK 20180405153151.0 cr unu---uuuuu 170326e20070301xx s 000 0 eng 10.1007/s00339-006-3794-7 doi (NATIONALLICENCE)springer-10.1007/s00339-006-3794-7 Using IR laser radiation for backside etching of fused silica [Elektronische Daten] [K. Zimmer, R. Böhme, B. Rauschenbach] Laser-induced backside etching of fused silica with gallium as highly absorbing liquid is demonstrated using pulsed infrared laser radiation. The influences of the laser fluence, the pulse number, and the pulse length on the etch rate and the etched surface topography were studied and the results are compared with these of excimer laser etching. The high reflectivity of the fused silica-gallium interface at IR wavelengths results in the measured high threshold fluences for etching of about 3J/cm2 and 7J/cm2 for 18ns and 73ns pulses, respectively. For both pulse lengths the etch rate rises almost linearly with laser fluence and reaches a value of 350 and 300nm/pulse at a laser fluence of about 12 and 28J/cm2, respectively. The etching process is almost free from incubation processes because etching with the first laser pulse and a constant etch rate were observed. The etched surfaces are well-defined with clear edges and a Gaussian-curved, smooth bottom. A roughness of about 1.5nm rms was measured by AFM at an etch depth of 0.95μm. The normalization of the etch rates with respect to the reflectivity and the pulse length results in similar etch rates and threshold fluence for the different pulse widths and wavelengths. It is concluded that etching is a thermal process including the laser heating, the materials melting, and the materials etching by mechanical forces. The backside etching of fused silica with IR-Nd:YAG laser can be a promising approach for the industrial usage of the backside etching of a wide range of materials. Springer-Verlag, 2006 Zimmer K. Leibniz-Institute for Surface Modification, Permoserstrasse 15, 04318, Leipzig, Germany aut Böhme R. Leibniz-Institute for Surface Modification, Permoserstrasse 15, 04318, Leipzig, Germany aut Rauschenbach B. Leibniz-Institute for Surface Modification, Permoserstrasse 15, 04318, Leipzig, Germany aut Applied Physics A Springer-Verlag 86/3(2007-03-01), 409-414 0947-8396 86:3<409 2007 86 339 https://doi.org/10.1007/s00339-006-3794-7 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s00339-006-3794-7 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Zimmer K. Leibniz-Institute for Surface Modification, Permoserstrasse 15, 04318, Leipzig, Germany aut NATIONALLICENCE 700 1- Böhme R. Leibniz-Institute for Surface Modification, Permoserstrasse 15, 04318, Leipzig, Germany aut NATIONALLICENCE 700 1- Rauschenbach B. Leibniz-Institute for Surface Modification, Permoserstrasse 15, 04318, Leipzig, Germany aut NATIONALLICENCE 773 0- Applied Physics A Springer-Verlag 86/3(2007-03-01), 409-414 0947-8396 86:3<409 2007 86 339 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer