caa a22 4500 463214943 CHVBK 20180405153153.0 cr unu---uuuuu 170326e20070401xx s 000 0 eng 10.1007/s00339-006-3856-x doi (NATIONALLICENCE)springer-10.1007/s00339-006-3856-x Growth and characterization of electro-deposited Cu2O and Cu thin films by amperometric I - T method on ITO/glass substrate [Elektronische Daten] [W. Shang, X. Shi, X. Zhang, C. Ma, C. Wang] Cuprous oxide and copper thin films were potentiostatically electro-deposited over indium-tin oxide (ITO) coated glass substrate with two different aqueous electrolytes: 0.1M KNO3 solution in comparison with the 0.05M CH3COOH/CH3COONa (pH=5.7) solution. Cyclic voltammetry (CV) was used to determine the optimal deposition potentials. A single pair redox peaks were observed in the CV for 0.05M CuSO4 in the buffer solution, while two redox couples were observed in the KNO3 solution. X-ray diffraction (XRD) and X-ray photo spectroscopy (XPS) revealed that in the buffer electrolyte the deposition for Cu2O, Cu and co-deposition alloy were formed at more negative potentials than in the KNO3. Furthermore, periodic structure can be obtained by controlling the deposition potentials in KNO3 with CuSO4 solution. The structural and morphological properties of the films have been investigated by means of scanning electron microscopy (SEM) and atomic force microscopy (AFM). Springer-Verlag, 2007 Shang W. Department of Chemistry, Lanzhou University, 730000, Lanzhou, P.R. China aut Shi X. Department of Chemistry, Lanzhou University, 730000, Lanzhou, P.R. China aut Zhang X. Department of Chemistry, Lanzhou University, 730000, Lanzhou, P.R. China aut Ma C. Department of Chemistry, Lanzhou University, 730000, Lanzhou, P.R. China aut Wang C. Department of Chemistry, Lanzhou University, 730000, Lanzhou, P.R. China aut Applied Physics A Springer-Verlag 87/1(2007-04-01), 129-135 0947-8396 87:1<129 2007 87 339 https://doi.org/10.1007/s00339-006-3856-x text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s00339-006-3856-x text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Shang W. Department of Chemistry, Lanzhou University, 730000, Lanzhou, P.R. China aut NATIONALLICENCE 700 1- Shi X. Department of Chemistry, Lanzhou University, 730000, Lanzhou, P.R. China aut NATIONALLICENCE 700 1- Zhang X. Department of Chemistry, Lanzhou University, 730000, Lanzhou, P.R. China aut NATIONALLICENCE 700 1- Ma C. Department of Chemistry, Lanzhou University, 730000, Lanzhou, P.R. China aut NATIONALLICENCE 700 1- Wang C. Department of Chemistry, Lanzhou University, 730000, Lanzhou, P.R. China aut NATIONALLICENCE 773 0- Applied Physics A Springer-Verlag 87/1(2007-04-01), 129-135 0947-8396 87:1<129 2007 87 339 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer