caa a22 4500 463215567 CHVBK 20180405153155.0 cr unu---uuuuu 170326e20070601xx s 000 0 eng 10.1007/s00339-007-3891-2 doi (NATIONALLICENCE)springer-10.1007/s00339-007-3891-2 104nm period grating fabrication in fused silica by immersion two-beam interferometric laser induced backside wet etching technique [Elektronische Daten] [C. Vass, K. Osvay, B. Hopp, Z. Bor] A substantial extension of the method of two-beam interferometric laser induced backside wet etching (TWIN-LIBWE), the immersion TWIN-LIBWE, is used to fabricate fused silica gratings with a 104nm period. The spatially filtered fourth harmonic of Nd:YAG laser (λ=266nm, τFWHM=8ns) pulses were split into two parts which then interfered at the backside of the fused silica target in contact with a liquid absorber (naphthalene methyl methacrylate saturated solution with a concentration of 1.85mol/dm3). The hypotenuse of a rectangular fused silica prism is attached to the fused silica target with the use of distilled water as the immersion liquid. On steering the beams through the sides of the prisms, the angle between the two laser beams has been substantially increased. The resulting period of 104nm is the minimal grating constant achievable under such experimental conditions and, to our knowledge, the smallest laser generated grating period in fused silica at present. Springer-Verlag, 2007 Vass C. Department of Optics and Quantum Electronics, University of Szeged, Dóm tér 9, 6720, Szeged, Hungary aut Osvay K. Department of Optics and Quantum Electronics, University of Szeged, Dóm tér 9, 6720, Szeged, Hungary aut Hopp B. Research Group on Laser Physics of the Hungarian Academy of Sciences, Dóm tér 9, 6720, Szeged, Hungary aut Bor Z. Department of Optics and Quantum Electronics, University of Szeged, Dóm tér 9, 6720, Szeged, Hungary aut Applied Physics A Springer-Verlag 87/4(2007-06-01), 611-613 0947-8396 87:4<611 2007 87 339 https://doi.org/10.1007/s00339-007-3891-2 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s00339-007-3891-2 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Vass C. Department of Optics and Quantum Electronics, University of Szeged, Dóm tér 9, 6720, Szeged, Hungary aut NATIONALLICENCE 700 1- Osvay K. Department of Optics and Quantum Electronics, University of Szeged, Dóm tér 9, 6720, Szeged, Hungary aut NATIONALLICENCE 700 1- Hopp B. Research Group on Laser Physics of the Hungarian Academy of Sciences, Dóm tér 9, 6720, Szeged, Hungary aut NATIONALLICENCE 700 1- Bor Z. Department of Optics and Quantum Electronics, University of Szeged, Dóm tér 9, 6720, Szeged, Hungary aut NATIONALLICENCE 773 0- Applied Physics A Springer-Verlag 87/4(2007-06-01), 611-613 0947-8396 87:4<611 2007 87 339 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer