caa a22 4500 463215591 CHVBK 20180405153155.0 cr unu---uuuuu 170326e20070601xx s 000 0 eng 10.1007/s00339-007-3866-3 doi (NATIONALLICENCE)springer-10.1007/s00339-007-3866-3 Enhanced stability of platinized silicon substrates using an unconventional adhesion layer deposited by CSD for high temperature dielectric thin film deposition [Elektronische Daten] [S. Halder, T. Schneller, R. Waser] Almost all platinized substrates manufactured presently use an TiO2 adhesion layer to improve the adhesion between the SiO2 and the Pt. These substrates however are stable till only 800°C. We show that simply by replacing the TiO2 with Al2O3, the stability of the electrodes can be increased to 1000°C and more. These substrates can be used for high temperature depositions which standard platinized substrates cannot withstand. Further we show that dielectric thin films of BaTiO3 and (Ba,Sr)TiO3 crystallized at higher temperatures show almost a threefold increase in permittivity on these high temperature stable platinized silicon substrates.The large increase in permittivity is attributed to an increase in grain size at high temperatures. Springer-Verlag, 2007 Halder S. Institut fuer Werkstoffe der Elektrotechnik, RWTH Aachen, 52056, Aachen, Germany aut Schneller T. Institut fuer Werkstoffe der Elektrotechnik, RWTH Aachen, 52056, Aachen, Germany aut Waser R. Institut fuer Werkstoffe der Elektrotechnik, RWTH Aachen, 52056, Aachen, Germany aut Applied Physics A Springer-Verlag 87/4(2007-06-01), 705-708 0947-8396 87:4<705 2007 87 339 https://doi.org/10.1007/s00339-007-3866-3 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s00339-007-3866-3 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Halder S. Institut fuer Werkstoffe der Elektrotechnik, RWTH Aachen, 52056, Aachen, Germany aut NATIONALLICENCE 700 1- Schneller T. Institut fuer Werkstoffe der Elektrotechnik, RWTH Aachen, 52056, Aachen, Germany aut NATIONALLICENCE 700 1- Waser R. Institut fuer Werkstoffe der Elektrotechnik, RWTH Aachen, 52056, Aachen, Germany aut NATIONALLICENCE 773 0- Applied Physics A Springer-Verlag 87/4(2007-06-01), 705-708 0947-8396 87:4<705 2007 87 339 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer