caa a22 4500 463221362 CHVBK 20180405153213.0 cr unu---uuuuu 170326e20070101xx s 000 0 eng 10.1007/s10853-006-1050-3 doi (NATIONALLICENCE)springer-10.1007/s10853-006-1050-3 Interfacial diffusion effect on phase transitions in Al/Mn multilayered thin films [Elektronische Daten] [A. Srivastava, K. Yu-Zhang, L. Kilian, J. Frigério, J. Rivory] Thin films of Al and Mn multilayers were synthesized using thermal evaporation under high vacuum conditions. The whole film thickness containing three bilayers of Al and Mn is about 120nm. The global concentration of the samples was varied between 10 and 46.5 at.% Mn, by changing the thickness of the bilayer. The as-evaporated samples were heat treated at different temperatures (473, 623, 823 and 873K) for 2 and 8h to investigate the interfacial diffusion induced phase transformations in the multilayered thin films. Transmission electron microscopy (TEM) has been mainly used to characterize the crystalline structure of a variety of phases revealed on annealing, such as μ, λ and φ phases up to 823K, δ phase at 823K and T6 phase at 873K. The occurrence of a variety of structures on annealing has been attributed to the interfacial reactions at the Al-Mn bilayers, and, therefore, the global composition of the composite films is not significant during the process of phase transformations. The crystallographic relationships of Al-Mn approximant structures of the decagonal quasicrystal are discussed to understand the evolution and stability of the T6 phase at high temperature. Springer Science+Business Media, LLC, 2006 Srivastava A. Electron Microscope Section, Division of Materials Characterization, National Physical Laboratory, 110 012, New Delhi, India aut Yu-Zhang K. Département de Physique, Université de Reims, B.P.1039, 51687, Reims cedex 02, France aut Kilian L. Département de Physique, Université de Reims, B.P.1039, 51687, Reims cedex 02, France aut Frigério J. Laboratoire d'Optique des Solides, Université P.et M.Curie, 4, Jussieu, 75252, Paris cedex 05, France aut Rivory J. Laboratoire d'Optique des Solides, Université P.et M.Curie, 4, Jussieu, 75252, Paris cedex 05, France aut Journal of Materials Science Springer US; http://www.springer-ny.com 42/1(2007-01-01), 185-190 0022-2461 42:1<185 2007 42 10853 https://doi.org/10.1007/s10853-006-1050-3 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s10853-006-1050-3 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Srivastava A. Electron Microscope Section, Division of Materials Characterization, National Physical Laboratory, 110 012, New Delhi, India aut NATIONALLICENCE 700 1- Yu-Zhang K. Département de Physique, Université de Reims, B.P.1039, 51687, Reims cedex 02, France aut NATIONALLICENCE 700 1- Kilian L. Département de Physique, Université de Reims, B.P.1039, 51687, Reims cedex 02, France aut NATIONALLICENCE 700 1- Frigério J. Laboratoire d'Optique des Solides, Université P.et M.Curie, 4, Jussieu, 75252, Paris cedex 05, France aut NATIONALLICENCE 700 1- Rivory J. Laboratoire d'Optique des Solides, Université P.et M.Curie, 4, Jussieu, 75252, Paris cedex 05, France aut NATIONALLICENCE 773 0- Journal of Materials Science Springer US; http://www.springer-ny.com 42/1(2007-01-01), 185-190 0022-2461 42:1<185 2007 42 10853 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer