caa a22 4500 463222059 CHVBK 20180405153215.0 cr unu---uuuuu 170326e20070801xx s 000 0 eng 10.1007/s10853-006-1461-1 doi (NATIONALLICENCE)springer-10.1007/s10853-006-1461-1 Systematic study on the influence of growth parameters on island density exponent, size distribution and scaling behaviour [Elektronische Daten] [Shankar Shrestha, Chong-Yun Park] We present the Monte Carlo simulation of submonolayer film growth during molecular beam epitaxy (MBE) at low temperature. We have made systematic study to see how the parameters diffusion to flux ratio (D/F), diffusional anisotropy (DA) and sticking anisotropy influences on island density exponent (χ), size distribution and scaling behaviour. We have found that, as diffusional anisotropy changes from DA=1 to DA=∝, the density exponent changes from χ=0.34±0.01 to 0.28±0.01 for isotropic sticking case but when sticking is anisotropic the density exponent changes from χ=0.31±0.01 to 0.24±0.01. The influence produced by DA on island size distribution is observed to depend on D/F ratio and sticking anisotropy. Depending on DA values and D/F ratio, the size distribution is also observed to be insensitive to the change in diffusional anisotropy. We also study the influence of diffusional anisotropy on scaling function for two sticking anisotropy condition. The scaling behaviour of island size distribution is observed to be not affected by all diffusional anisotropy as well as sticking anisotropy condition. Springer Science+Business Media, LLC, 2007 Shrestha Shankar Department of Physics, Tribhuvan University, Patan Multiple Campus, Patan Dhoka, Lalitpur, Nepal aut Park Chong-Yun Department of Physics, Sung Kyun Kwan University, 440-746, Suwon, South Korea aut Journal of Materials Science Kluwer Academic Publishers-Plenum Publishers; http://www.springer-ny.com 42/16(2007-08-01), 6762-6768 0022-2461 42:16<6762 2007 42 10853 https://doi.org/10.1007/s10853-006-1461-1 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s10853-006-1461-1 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Shrestha Shankar Department of Physics, Tribhuvan University, Patan Multiple Campus, Patan Dhoka, Lalitpur, Nepal aut NATIONALLICENCE 700 1- Park Chong-Yun Department of Physics, Sung Kyun Kwan University, 440-746, Suwon, South Korea aut NATIONALLICENCE 773 0- Journal of Materials Science Kluwer Academic Publishers-Plenum Publishers; http://www.springer-ny.com 42/16(2007-08-01), 6762-6768 0022-2461 42:16<6762 2007 42 10853 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer