caa a22 4500 46322308X CHVBK 20180405153218.0 cr unu---uuuuu 170326e20070301xx s 000 0 eng 10.1007/s10853-006-0174-9 doi (NATIONALLICENCE)springer-10.1007/s10853-006-0174-9 Preparation of nitrogen-doped YSZ thin films by pulsed laser deposition and their characterization [Elektronische Daten] [I. Valov, R. De Souza, C. Wang, A. Börger, C. Korte, M. Martin, K. Becker, J. Janek] The pulsed laser deposition technique was applied to deposit nitrogen-doped yttria stabilized zirconia (YSZ) thin films. The working parameters were varied in order to achieve a maximal nitrogen content. The films were characterized by SIMS, XPS, X-ray diffraction and optical spectroscopy. The surface topography was studied by AFM and HRSEM. The influence of the deposition parameters on the film properties is discussed. Springer Science+Business Media, LLC, 2007 Valov I. Institute of Physical Chemistry, Justus-Liebig University, Heinrich-Buff-Ring 58, 35392, Giessen, Germany aut De Souza R. Institute of Physical Chemistry, RWTH Aachen University, Landoltweg 2, 52056, Aachen, Germany aut Wang C. 1st Physical Institute, Justus-Liebig University, Heinrich-Buff-Ring 16, 35392, Giessen, Germany aut Börger A. Institute of Physical and Theoretical Chemistry, TU-Braunschweig, Hans-Sommer-Straße 10, 38106, Braunschweig, Germany aut Korte C. Institute of Physical Chemistry, Justus-Liebig University, Heinrich-Buff-Ring 58, 35392, Giessen, Germany aut Martin M. Institute of Physical Chemistry, RWTH Aachen University, Landoltweg 2, 52056, Aachen, Germany aut Becker K. Institute of Physical and Theoretical Chemistry, TU-Braunschweig, Hans-Sommer-Straße 10, 38106, Braunschweig, Germany aut Janek J. Institute of Physical Chemistry, Justus-Liebig University, Heinrich-Buff-Ring 58, 35392, Giessen, Germany aut Journal of Materials Science Kluwer Academic Publishers-Plenum Publishers; http://www.springer-ny.com 42/6(2007-03-01), 1931-1941 0022-2461 42:6<1931 2007 42 10853 https://doi.org/10.1007/s10853-006-0174-9 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s10853-006-0174-9 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Valov I. Institute of Physical Chemistry, Justus-Liebig University, Heinrich-Buff-Ring 58, 35392, Giessen, Germany aut NATIONALLICENCE 700 1- De Souza R. Institute of Physical Chemistry, RWTH Aachen University, Landoltweg 2, 52056, Aachen, Germany aut NATIONALLICENCE 700 1- Wang C. 1st Physical Institute, Justus-Liebig University, Heinrich-Buff-Ring 16, 35392, Giessen, Germany aut NATIONALLICENCE 700 1- Börger A. Institute of Physical and Theoretical Chemistry, TU-Braunschweig, Hans-Sommer-Straße 10, 38106, Braunschweig, Germany aut NATIONALLICENCE 700 1- Korte C. Institute of Physical Chemistry, Justus-Liebig University, Heinrich-Buff-Ring 58, 35392, Giessen, Germany aut NATIONALLICENCE 700 1- Martin M. Institute of Physical Chemistry, RWTH Aachen University, Landoltweg 2, 52056, Aachen, Germany aut NATIONALLICENCE 700 1- Becker K. Institute of Physical and Theoretical Chemistry, TU-Braunschweig, Hans-Sommer-Straße 10, 38106, Braunschweig, Germany aut NATIONALLICENCE 700 1- Janek J. Institute of Physical Chemistry, Justus-Liebig University, Heinrich-Buff-Ring 58, 35392, Giessen, Germany aut NATIONALLICENCE 773 0- Journal of Materials Science Kluwer Academic Publishers-Plenum Publishers; http://www.springer-ny.com 42/6(2007-03-01), 1931-1941 0022-2461 42:6<1931 2007 42 10853 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer