caa a22 4500 463225236 CHVBK 20180405153224.0 cr unu---uuuuu 170326e20070601xx s 000 0 eng 10.1007/s10853-006-0575-9 doi (NATIONALLICENCE)springer-10.1007/s10853-006-0575-9 Physical properties of low- k films based on the co-condensation of methyltrimethoxysilane with a bridged silsesquioxane [Elektronische Daten] [B. Kim, J. Kang, K. Lee, J. Son, M. Ko] Though spin-on organosilicates are considered as the promising candidates of low dielectric constant materials, it is necessary for a successful integration to improve mechanical strength such as modulus and fracture toughness. In this study, five sets of MTMS-BTMSE copolymers were synthesized and characterized while the monomer content of BTMSE (bis(trimethoxysilyl)ethane) was varied from 9.1 to 47.3mol% vs. MTMS (methyltrimethoxysilane). In parallel with the measurement of dielectric constant, four different tests were carried out to evaluate mechanical properties of the MTMS-BTMSE copolymers. Modulus was measured by the nanoindentation technique and the modified edge lift-off test (MELT) was employed to extract adhesive fracture toughness quantitatively. In addition, residual stress was calculated by sensing the change in radius of curvature of the substrate. The chemical structure of the copolymers was also analyzed with FTIR and NMR. Network formation was enhanced as the amount of BTMSE increased, which led to improvement of modulus and the increase in refractive index and dielectric constant. However, an increasing rate of fracture toughness by the MELT was not proportional to the increase in the amount of BTMSE, which implied that it was necessary to optimize the composition of the copolymers since adhesion strength was conjectured the most critical factor for a successful integration. Springer Science+Business Media, LLC, 2007 Kim B. LG Chem. Ltd., Research Park, 104-1 Moonji-dong, Yuseong-gu, 305-380, Daejeon, Korea aut Kang J. LG Chem. Ltd., Research Park, 104-1 Moonji-dong, Yuseong-gu, 305-380, Daejeon, Korea aut Lee K. LG Chem. Ltd., Research Park, 104-1 Moonji-dong, Yuseong-gu, 305-380, Daejeon, Korea aut Son J. LG Chem. Ltd., Research Park, 104-1 Moonji-dong, Yuseong-gu, 305-380, Daejeon, Korea aut Ko M. LG Chem. Ltd., Research Park, 104-1 Moonji-dong, Yuseong-gu, 305-380, Daejeon, Korea aut Journal of Materials Science Kluwer Academic Publishers-Plenum Publishers; http://www.springer-ny.com 42/12(2007-06-01), 4591-4602 0022-2461 42:12<4591 2007 42 10853 https://doi.org/10.1007/s10853-006-0575-9 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s10853-006-0575-9 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Kim B. LG Chem. Ltd., Research Park, 104-1 Moonji-dong, Yuseong-gu, 305-380, Daejeon, Korea aut NATIONALLICENCE 700 1- Kang J. LG Chem. Ltd., Research Park, 104-1 Moonji-dong, Yuseong-gu, 305-380, Daejeon, Korea aut NATIONALLICENCE 700 1- Lee K. LG Chem. Ltd., Research Park, 104-1 Moonji-dong, Yuseong-gu, 305-380, Daejeon, Korea aut NATIONALLICENCE 700 1- Son J. LG Chem. Ltd., Research Park, 104-1 Moonji-dong, Yuseong-gu, 305-380, Daejeon, Korea aut NATIONALLICENCE 700 1- Ko M. LG Chem. Ltd., Research Park, 104-1 Moonji-dong, Yuseong-gu, 305-380, Daejeon, Korea aut NATIONALLICENCE 773 0- Journal of Materials Science Kluwer Academic Publishers-Plenum Publishers; http://www.springer-ny.com 42/12(2007-06-01), 4591-4602 0022-2461 42:12<4591 2007 42 10853 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer