caa a22 4500 463227921 CHVBK 20180405153232.0 cr unu---uuuuu 170326e20071201xx s 000 0 eng 10.1007/s10853-007-2098-4 doi (NATIONALLICENCE)springer-10.1007/s10853-007-2098-4 Mass spectroscopic measuring of SiCl n ( n =0-2) radicals in SiCl4 RF glow discharge plasma [Elektronische Daten] [Zhaokui Wang, Yanhui Lou] The relative densities of SiCl n (n=0-2) in SiCl4 radio frequency (rf) glow discharge plasma are measured by mass spectrometry. The effects of discharge parameters, i.e., rf power, discharge pressure, substrate temperature, and SiCl4 flow rate on the relative densities of SiCl n (n=0-2) are investigated in detail. An optimum configuration of discharge parameters (low rf power, high discharge pressure, low substrate temperature, and low flow rate), which enhanced the formation of SiCl n (n=0-2) radicals, is searched by a great deal of measurements and discussions. In the optimum configuration of discharge parameters, we measure the spatial distribution of SiCl n (n=0-2) radicals in the most optimized plasma parameters. The experimental results reveal that Si and SiCl may be the dominant precursors in forming the thin film. Springer Science+Business Media, LLC, 2007 Wang Zhaokui Department of Physics, Henan Normal University, 453007, Xinxiang, P.R. China aut Lou Yanhui Department of Physics, Henan Normal University, 453007, Xinxiang, P.R. China aut Journal of Materials Science Springer US; http://www.springer-ny.com 42/24(2007-12-01), 9920-9926 0022-2461 42:24<9920 2007 42 10853 https://doi.org/10.1007/s10853-007-2098-4 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s10853-007-2098-4 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Wang Zhaokui Department of Physics, Henan Normal University, 453007, Xinxiang, P.R. China aut NATIONALLICENCE 700 1- Lou Yanhui Department of Physics, Henan Normal University, 453007, Xinxiang, P.R. China aut NATIONALLICENCE 773 0- Journal of Materials Science Springer US; http://www.springer-ny.com 42/24(2007-12-01), 9920-9926 0022-2461 42:24<9920 2007 42 10853 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer