caa a22 4500 463228790 CHVBK 20180405153235.0 cr unu---uuuuu 170326e20070901xx s 000 0 eng 10.1007/s10853-007-1569-y doi (NATIONALLICENCE)springer-10.1007/s10853-007-1569-y Phase equilibria in the pseudo-binary In2O3-SnO2 system [Elektronische Daten] [William Heward, Douglas Swenson] The pseudo-binary In2O3-SnO2 phase diagram has been determined in the range of 1000-1650°C using electron probe microanalysis (EPMA) and x-ray diffraction (XRD) analysis of solid-state sintered samples. The solubility of SnO2 in In2O3 was found to range from 1.3mol% at 1000°C to a maximum of 13.1mol% at 1650°C, indicating that commercial SnO2-doped In2O3 thin films are thermodynamically metastable. In2O3 was found to have negligible solubility in SnO2 throughout the temperatures examined. In this study two intermediate compounds, In4Sn3O12 and In2SnO5, were found. Each phase was found to be stable only at high temperatures, decomposing eutectoidally at 1325 and 1575°C, respectively. This is believed to be the first report of the high temperature phase In2SnO5, which is attractive for future research as a transparent conducting oxide. Springer Science+Business Media, LLC, 2007 Heward William Department of Materials Science and Engineering, Michigan Technological University, 49931, Houghton, MI, USA aut Swenson Douglas Department of Materials Science and Engineering, Michigan Technological University, 49931, Houghton, MI, USA aut Journal of Materials Science Kluwer Academic Publishers-Plenum Publishers; http://www.springer-ny.com 42/17(2007-09-01), 7135-7140 0022-2461 42:17<7135 2007 42 10853 https://doi.org/10.1007/s10853-007-1569-y text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s10853-007-1569-y text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Heward William Department of Materials Science and Engineering, Michigan Technological University, 49931, Houghton, MI, USA aut NATIONALLICENCE 700 1- Swenson Douglas Department of Materials Science and Engineering, Michigan Technological University, 49931, Houghton, MI, USA aut NATIONALLICENCE 773 0- Journal of Materials Science Kluwer Academic Publishers-Plenum Publishers; http://www.springer-ny.com 42/17(2007-09-01), 7135-7140 0022-2461 42:17<7135 2007 42 10853 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer